应用于量子技术的超导器件的纳米级直接写入制备

J. D. de Teresa
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摘要

本文综述了利用聚焦电子束和离子束直接制造纳米级超导器件及其在量子技术中的应用的研究现状。本文首先介绍了超导器件的主要种类,以及采用光学光刻和电子束光刻等标准光刻技术制备超导器件的方法。然后,通过铣削或辐照,展示了超导体的聚焦离子束图像化,以及通过聚焦电子和离子束诱导沉积,超导器件的生长。我们认为,这些无电阻直接生长技术对量子技术的主要好处包括制造电纳米接触和电路编辑的能力,高分辨率超导谐振器的制造,为尖端传感器创建约瑟夫森结和squid,高tc squid和其他超导电路的图像化,以及对通量电子学和拓扑超导性的探索。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Nanoscale direct-write fabrication of superconducting devices for application in quantum technologies
In this Perspective article, we evaluate the current state of research on the use of focused electron and ion beams to directly fabricate nanoscale superconducting devices with application in quantum technologies. First, the article introduces the main superconducting devices and their fabrication by means of standard lithography techniques such as optical lithography and electron beam lithography. Then, focused ion beam patterning of superconductors through milling or irradiation is shown, as well as the growth of superconducting devices by means of focused electron and ion beam induced deposition. We suggest that the key benefits of these resist-free direct-growth techniques for quantum technologies include the ability to make electrical nanocontacts and circuit edit, fabrication of high-resolution superconducting resonators, creation of Josephson junctions and SQUIDs for on-tip sensors, patterning of high-Tc SQUIDs and other superconducting circuits, and the exploration of fluxtronics and topological superconductivity.
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