用GaAs(Sb)/AlGaAsSb复合层改善柱状InGaAs量子点结构的点尺寸均匀性

Wei-Sheng Liu, Hsiao-Chien Lin, Ren-Yo Liu, Min Wu
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引用次数: 0

摘要

本研究利用分子束外延系统在GaAs(001)衬底上生长出高质量垂直排列的InGaAs量子点(QDs)。采用GaAsSb/AlGaAsSb复合过长层覆盖InGaAs量子点,提高了点尺寸均匀性。从实验结果来看,含sb的过生长层减少了In-Ga的混合,有助于提高点状尺寸的均匀性。通过透射发射显微镜、能量色散x射线能谱(EDX)和电子能量损失能谱的测量,具有GaAsSb/AlGaAsSb复合结构的垂直排列量子点具有较高的点密度和点大小均匀性。此外,由于应变场的分布,在量子点的顶部区域有Sb成分的积累。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Improvements of dot-size uniformity of the columnar InGaAs quantum dot structures with GaAs(Sb)/AlGaAsSb composite layers
This study grew high quality vertically-aligned InGaAs quantum dots (QDs) on a GaAs (001) substrate by using the molecular beam epitaxy system. The GaAsSb/AlGaAsSb composite overgrown layer was adopted to cap on InGaAs QDs for improving the dot size uniformity. From the experimental results, the Sb-contained overgrown layer was observed to reduce the In-Ga intermixing and contribute to the enhancement of the dot-size uniformity. Through the measurements of transmission emission microscopy, energy-dispersive X-ray spectroscopy (EDX) and electron-energy-loss spectrometry, vertically-aligned QDs with GaAsSb/AlGaAsSb composite structure show high dot density and dot-size uniformity. In addition, the Sb composition was observed accumulate on the top region of QDs because of the strain field distribution.
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