Odilon O. Dutra, Gustavo D. Colleta, L. H. C. Ferreira, T. Pimenta
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引用次数: 2
摘要
这项工作描述了一种Izhikevich神经元模型的当前模式实现,该模型采用了在m × n阶矩阵内结构的130 nm的晕植入器件,能够大大增加此类器件的输出阻抗,同时也改善了失配。所提出的神经元在130 nm IBM CMOS工艺中成功仿真,所采用的动态跨线性电路拓扑产生了Izhikevich模型中定义的20种模式,并在250 mV的低电源电压下改进了几个方面。
A sub-threshold halo implanted MOS implementation of Izhikevich neuron model
This work describes a current mode implementation of Izhikevich neuron model implemented with halo implanted devices 130 nm structured within matrices of order m × n capable of substantially increasing output impedance of such devices while also improving mismatch. The proposed neuron was successfully simulated in 130 nm IBM CMOS process as the dynamical translinear circuit topology adopted generates the 20 patterns defined in Izhikevich model as other similar works while improving several aspects as the low supplied voltage used 250 mV.