采用自屏蔽技术的新型高压集成电路

T. Yamazaki, N. Kumagai, K. Oyabe, G. Tada, H. Takeda, Y. Seki, K. Sakurai
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引用次数: 4

摘要

自隔离结构中的自屏蔽技术可以在不降低电气隔离结构的阻塞能力的情况下获得高压互连,并在ISPSD'96中作为高压电平移位器进行了介绍和演示(Fujihira et al., 1996)。然而,由于IGBT开关具有高dV/dt,导致位移电流流经n井/p-sub结的耗尽层电容,因此具有成本效益的自隔离结构难以完全抑制寄生晶闸管或双极晶体管的作用。本文首次利用优化后的n阱片电阻和高侧n阱区的设计规则,实验证明了采用自屏蔽技术和自隔离结构设计的600 V级IGBT逆变电路具有优异的dV/dt鲁棒性的新型高压集成电路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
New high voltage integrated circuits using self-shielding technique
A self-shielding technique in a self-isolation structure which makes it possible to obtain a high-voltage interconnection without degrading the blocking capability of the electrical isolation structure has been introduced and demonstrated as a high voltage level-shifter in ISPSD'96 (Fujihira et al., 1996). However, a cost-effective self-isolation structure has difficulty in suppressing the action of a parasitic thyristor or bipolar transistor completely, because of the displacement current flowing through the depletion layer capacitance of the n-well/p-sub junction caused by the IGBT switching that has high dV/dt. In this work, by applying the optimized n-well sheet resistance and design rule in the high-side n-well region, new high voltage integrated circuits (HVIC) with excellent dV/dt robustness using the self-shielding technique and self-isolation structure designed for 600 V class IGBT invertor circuits is experimentally demonstrated for the first time.
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