{"title":"纳米光刻用光敏超材料","authors":"Youngseop Lee, Sang-Gil Park, S. Jeon, K. Jeong","doi":"10.1109/OMN.2014.6924591","DOIUrl":null,"url":null,"abstract":"This work presents the novel photosensitive metamaterial (metaphotoresist) with silver (Ag) and dielectric multilayer for ultraviolet nanolithography overcoming a diffraction limit. The metamaterial consists of multilayer with Ag and photoresist (PR) layers. A plasmonic UV light coupling under diffraction limit in the metamaterial was numerically demonstrated by using a finite difference time domain (FDTD) method. Nanolithography was demonstrated by using the metaphotoresist (meta-PR) and a conventional UV (λ=365 nm) alignment system. The meta-PR was fabricated by spin-coating of PR and angled deposition of Ag nanostructures. About 150 nm nanopatterns were fabricated. We believe that the metaphotoresist provides new direction for nanolithography industries.","PeriodicalId":161791,"journal":{"name":"2014 International Conference on Optical MEMS and Nanophotonics","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Photosensitive metamaterial for nanolithography\",\"authors\":\"Youngseop Lee, Sang-Gil Park, S. Jeon, K. Jeong\",\"doi\":\"10.1109/OMN.2014.6924591\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This work presents the novel photosensitive metamaterial (metaphotoresist) with silver (Ag) and dielectric multilayer for ultraviolet nanolithography overcoming a diffraction limit. The metamaterial consists of multilayer with Ag and photoresist (PR) layers. A plasmonic UV light coupling under diffraction limit in the metamaterial was numerically demonstrated by using a finite difference time domain (FDTD) method. Nanolithography was demonstrated by using the metaphotoresist (meta-PR) and a conventional UV (λ=365 nm) alignment system. The meta-PR was fabricated by spin-coating of PR and angled deposition of Ag nanostructures. About 150 nm nanopatterns were fabricated. We believe that the metaphotoresist provides new direction for nanolithography industries.\",\"PeriodicalId\":161791,\"journal\":{\"name\":\"2014 International Conference on Optical MEMS and Nanophotonics\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-10-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 International Conference on Optical MEMS and Nanophotonics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/OMN.2014.6924591\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 International Conference on Optical MEMS and Nanophotonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMN.2014.6924591","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
This work presents the novel photosensitive metamaterial (metaphotoresist) with silver (Ag) and dielectric multilayer for ultraviolet nanolithography overcoming a diffraction limit. The metamaterial consists of multilayer with Ag and photoresist (PR) layers. A plasmonic UV light coupling under diffraction limit in the metamaterial was numerically demonstrated by using a finite difference time domain (FDTD) method. Nanolithography was demonstrated by using the metaphotoresist (meta-PR) and a conventional UV (λ=365 nm) alignment system. The meta-PR was fabricated by spin-coating of PR and angled deposition of Ag nanostructures. About 150 nm nanopatterns were fabricated. We believe that the metaphotoresist provides new direction for nanolithography industries.
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