J. Dell, K. Winchester, C. Musca, J. Antoszewski, L. Faraone
{"title":"由PECVD氮化硅制成的可变mems电感","authors":"J. Dell, K. Winchester, C. Musca, J. Antoszewski, L. Faraone","doi":"10.1109/COMMAD.2002.1237315","DOIUrl":null,"url":null,"abstract":"This paper presents the implementation of inductors for on-chip integration with RF electronics. The inductors were fabricated using silicon bulk micromachining to form a micro-electro-mechanical system (MEMS) that is free from eddy-current losses found in spiral inductors formed using conventional silicon processing. By using the fabrication approach developed here, the resulting inductors are electrically tunable with the application of low DC bias voltages.","PeriodicalId":129668,"journal":{"name":"2002 Conference on Optoelectronic and Microelectronic Materials and Devices. COMMAD 2002. Proceedings (Cat. No.02EX601)","volume":"176 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-12-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":"{\"title\":\"Variable MEMS-based inductors fabricated from PECVD silicon nitride\",\"authors\":\"J. Dell, K. Winchester, C. Musca, J. Antoszewski, L. Faraone\",\"doi\":\"10.1109/COMMAD.2002.1237315\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents the implementation of inductors for on-chip integration with RF electronics. The inductors were fabricated using silicon bulk micromachining to form a micro-electro-mechanical system (MEMS) that is free from eddy-current losses found in spiral inductors formed using conventional silicon processing. By using the fabrication approach developed here, the resulting inductors are electrically tunable with the application of low DC bias voltages.\",\"PeriodicalId\":129668,\"journal\":{\"name\":\"2002 Conference on Optoelectronic and Microelectronic Materials and Devices. COMMAD 2002. Proceedings (Cat. No.02EX601)\",\"volume\":\"176 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-12-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"9\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2002 Conference on Optoelectronic and Microelectronic Materials and Devices. COMMAD 2002. Proceedings (Cat. No.02EX601)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/COMMAD.2002.1237315\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2002 Conference on Optoelectronic and Microelectronic Materials and Devices. COMMAD 2002. Proceedings (Cat. No.02EX601)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/COMMAD.2002.1237315","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Variable MEMS-based inductors fabricated from PECVD silicon nitride
This paper presents the implementation of inductors for on-chip integration with RF electronics. The inductors were fabricated using silicon bulk micromachining to form a micro-electro-mechanical system (MEMS) that is free from eddy-current losses found in spiral inductors formed using conventional silicon processing. By using the fabrication approach developed here, the resulting inductors are electrically tunable with the application of low DC bias voltages.