E. Murakami, T. Takeshita, K. Oda, M. Kobayashi, K. Asayama, M. Okamoto
{"title":"基于时变门电流特性的商用sic - mosfet分类","authors":"E. Murakami, T. Takeshita, K. Oda, M. Kobayashi, K. Asayama, M. Okamoto","doi":"10.1109/IRPS48203.2023.10117833","DOIUrl":null,"url":null,"abstract":"SiC-MOSFETs with high reliability have been desired for electric vehicles. We classify commercial SiC-MOSFETs into “heavily nitrided” and “lightly nitrided” based on time-dependent gate-current characteristics of fabricated devices. In “heavily nitrided” devices for higher mobility, high-voltage gate pulse for screening of B-mode (extrinsic defects) causes hole-trapping near the SiO2/SiC interface through impact ionization. This phenomenon leads to an increase in gate current as well as a negative shift of threshold voltage. Moreover, this is enhanced at low temperatures (-60, 25°C). Thus, high-temperature (200°C) screening is preferable. In addition, the relation between Weibull slopes for time-to-breakdown and charge-to-breakdown is closely examined.","PeriodicalId":159030,"journal":{"name":"2023 IEEE International Reliability Physics Symposium (IRPS)","volume":"76 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Classification of Commercial SiC-MOSFETs Based on Time-Dependent Gate-current Characteristics\",\"authors\":\"E. Murakami, T. Takeshita, K. Oda, M. Kobayashi, K. Asayama, M. Okamoto\",\"doi\":\"10.1109/IRPS48203.2023.10117833\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"SiC-MOSFETs with high reliability have been desired for electric vehicles. We classify commercial SiC-MOSFETs into “heavily nitrided” and “lightly nitrided” based on time-dependent gate-current characteristics of fabricated devices. In “heavily nitrided” devices for higher mobility, high-voltage gate pulse for screening of B-mode (extrinsic defects) causes hole-trapping near the SiO2/SiC interface through impact ionization. This phenomenon leads to an increase in gate current as well as a negative shift of threshold voltage. Moreover, this is enhanced at low temperatures (-60, 25°C). Thus, high-temperature (200°C) screening is preferable. In addition, the relation between Weibull slopes for time-to-breakdown and charge-to-breakdown is closely examined.\",\"PeriodicalId\":159030,\"journal\":{\"name\":\"2023 IEEE International Reliability Physics Symposium (IRPS)\",\"volume\":\"76 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 IEEE International Reliability Physics Symposium (IRPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRPS48203.2023.10117833\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE International Reliability Physics Symposium (IRPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS48203.2023.10117833","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Classification of Commercial SiC-MOSFETs Based on Time-Dependent Gate-current Characteristics
SiC-MOSFETs with high reliability have been desired for electric vehicles. We classify commercial SiC-MOSFETs into “heavily nitrided” and “lightly nitrided” based on time-dependent gate-current characteristics of fabricated devices. In “heavily nitrided” devices for higher mobility, high-voltage gate pulse for screening of B-mode (extrinsic defects) causes hole-trapping near the SiO2/SiC interface through impact ionization. This phenomenon leads to an increase in gate current as well as a negative shift of threshold voltage. Moreover, this is enhanced at low temperatures (-60, 25°C). Thus, high-temperature (200°C) screening is preferable. In addition, the relation between Weibull slopes for time-to-breakdown and charge-to-breakdown is closely examined.