G. Klár, Jeff Budsberg, Matt Titus, Stephen Jones, K. Museth
{"title":"生产就绪的MPM模拟","authors":"G. Klár, Jeff Budsberg, Matt Titus, Stephen Jones, K. Museth","doi":"10.1145/3084363.3085066","DOIUrl":null,"url":null,"abstract":"We present two complementary techniques for Material Point Method (MPM) based simulations to improve their performance and to allow for fine-grained artistic control. Our entirely GPU-based solver is able perform up to five times faster than its multithreaded CPU counterpart as a result of our novel particle and grid transfer algorithms. On top of this, we introduce Adaptive Particle Activation, that both makes it possible to simulate only a reduced number of particles, and to give artists means for fine direction over the simulation.","PeriodicalId":163368,"journal":{"name":"ACM SIGGRAPH 2017 Talks","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Production ready MPM simulations\",\"authors\":\"G. Klár, Jeff Budsberg, Matt Titus, Stephen Jones, K. Museth\",\"doi\":\"10.1145/3084363.3085066\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present two complementary techniques for Material Point Method (MPM) based simulations to improve their performance and to allow for fine-grained artistic control. Our entirely GPU-based solver is able perform up to five times faster than its multithreaded CPU counterpart as a result of our novel particle and grid transfer algorithms. On top of this, we introduce Adaptive Particle Activation, that both makes it possible to simulate only a reduced number of particles, and to give artists means for fine direction over the simulation.\",\"PeriodicalId\":163368,\"journal\":{\"name\":\"ACM SIGGRAPH 2017 Talks\",\"volume\":\"5 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-07-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ACM SIGGRAPH 2017 Talks\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1145/3084363.3085066\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACM SIGGRAPH 2017 Talks","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1145/3084363.3085066","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
We present two complementary techniques for Material Point Method (MPM) based simulations to improve their performance and to allow for fine-grained artistic control. Our entirely GPU-based solver is able perform up to five times faster than its multithreaded CPU counterpart as a result of our novel particle and grid transfer algorithms. On top of this, we introduce Adaptive Particle Activation, that both makes it possible to simulate only a reduced number of particles, and to give artists means for fine direction over the simulation.
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