氧化钽基电阻开关器件中导电丝结构和离子迁移行为的密度泛函研究综述

Satoshi Watanabe, B. Xiao
{"title":"氧化钽基电阻开关器件中导电丝结构和离子迁移行为的密度泛函研究综述","authors":"Satoshi Watanabe, B. Xiao","doi":"10.1109/INEC.2014.7460431","DOIUrl":null,"url":null,"abstract":"We have performed density functional calculations toward the microscopic understanding of tantalum oxide based resistive switching devices. In this review, we discuss the structures and electric properties of the conductive filaments in Cu/Ta2O5/Pt and Pt/TaOx/Pt resistive switching devices. We also discuss the migration behaviors of Cu and O ions in these devices.","PeriodicalId":188668,"journal":{"name":"2014 IEEE International Nanoelectronics Conference (INEC)","volume":"197 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-07-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Review of our density functional study on the structures of conductive filaments and ion migration behaviors in tantalum oxide based resistive switching devices\",\"authors\":\"Satoshi Watanabe, B. Xiao\",\"doi\":\"10.1109/INEC.2014.7460431\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have performed density functional calculations toward the microscopic understanding of tantalum oxide based resistive switching devices. In this review, we discuss the structures and electric properties of the conductive filaments in Cu/Ta2O5/Pt and Pt/TaOx/Pt resistive switching devices. We also discuss the migration behaviors of Cu and O ions in these devices.\",\"PeriodicalId\":188668,\"journal\":{\"name\":\"2014 IEEE International Nanoelectronics Conference (INEC)\",\"volume\":\"197 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-07-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 IEEE International Nanoelectronics Conference (INEC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/INEC.2014.7460431\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE International Nanoelectronics Conference (INEC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INEC.2014.7460431","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

我们已经进行了密度泛函计算,以微观理解氧化钽基电阻开关器件。本文讨论了Cu/Ta2O5/Pt和Pt/TaOx/Pt电阻开关器件中导电丝的结构和电性能。我们还讨论了Cu和O离子在这些器件中的迁移行为。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Review of our density functional study on the structures of conductive filaments and ion migration behaviors in tantalum oxide based resistive switching devices
We have performed density functional calculations toward the microscopic understanding of tantalum oxide based resistive switching devices. In this review, we discuss the structures and electric properties of the conductive filaments in Cu/Ta2O5/Pt and Pt/TaOx/Pt resistive switching devices. We also discuss the migration behaviors of Cu and O ions in these devices.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信