N. Ashizawa, Y. Sato, H. Watanabe, Y. Teramoto, T. Shirai, S. Morimoto, Hironobu Yabuya, Kazuya Aoki, D. Yajima, A. Nagano
{"title":"用于EUV掩模检测的高亮度LDP EUV源","authors":"N. Ashizawa, Y. Sato, H. Watanabe, Y. Teramoto, T. Shirai, S. Morimoto, Hironobu Yabuya, Kazuya Aoki, D. Yajima, A. Nagano","doi":"10.1117/12.2600974","DOIUrl":null,"url":null,"abstract":"The Laser-assisted Discharge-produced Plasma (LDP) EUV source has been developed as a light source for actinic mask inspection and beamline application and deployed in the field. LDP EUV source enables to generate high brightness with relatively larger EUV plasma by discharged plasma triggered by laser on one electrode disc which is coated by tin film. \nAs EUVL process is used more in mass-production process, the requirement for EUV source for mask inspection is required more. USHIO LDP source has overcome various issues specialized from LDP source and realized high reliability 24/7 based operation with high brightness maintained.","PeriodicalId":169926,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2021","volume":"10 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-09-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"High-brightness LDP EUV source for EUV mask inspection\",\"authors\":\"N. Ashizawa, Y. Sato, H. Watanabe, Y. Teramoto, T. Shirai, S. Morimoto, Hironobu Yabuya, Kazuya Aoki, D. Yajima, A. Nagano\",\"doi\":\"10.1117/12.2600974\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The Laser-assisted Discharge-produced Plasma (LDP) EUV source has been developed as a light source for actinic mask inspection and beamline application and deployed in the field. LDP EUV source enables to generate high brightness with relatively larger EUV plasma by discharged plasma triggered by laser on one electrode disc which is coated by tin film. \\nAs EUVL process is used more in mass-production process, the requirement for EUV source for mask inspection is required more. USHIO LDP source has overcome various issues specialized from LDP source and realized high reliability 24/7 based operation with high brightness maintained.\",\"PeriodicalId\":169926,\"journal\":{\"name\":\"International Conference on Extreme Ultraviolet Lithography 2021\",\"volume\":\"10 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-09-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference on Extreme Ultraviolet Lithography 2021\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2600974\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Extreme Ultraviolet Lithography 2021","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2600974","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
High-brightness LDP EUV source for EUV mask inspection
The Laser-assisted Discharge-produced Plasma (LDP) EUV source has been developed as a light source for actinic mask inspection and beamline application and deployed in the field. LDP EUV source enables to generate high brightness with relatively larger EUV plasma by discharged plasma triggered by laser on one electrode disc which is coated by tin film.
As EUVL process is used more in mass-production process, the requirement for EUV source for mask inspection is required more. USHIO LDP source has overcome various issues specialized from LDP source and realized high reliability 24/7 based operation with high brightness maintained.
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