Ni-Fe/SiO/sub / 2/铁磁薄膜及铁磁多层膜的性能

J. Neamtu, A. Coraci, O. Buiu
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引用次数: 0

摘要

研究了用高真空蒸发和直流溅射法制备的Fe、Ni、permalalloy单层和Ni-Fe/SiO/sub - 2/多层交替薄膜的性能。在多层薄膜的情况下,高频下的相对磁导率大大提高,证实了0.2 /spl mu/m薄磁层之间存在静磁耦合。交替Ni-Fe/SiO/sub - 2/多层薄膜可用于磁阻头和磁阻传感器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Properties of ferromagnetic thin films and ferromagnetic multilayers of Ni-Fe/SiO/sub 2/
The properties of Fe, Ni, and permalloy monolayer and alternating Ni-Fe/SiO/sub 2/ multilayer thin films prepared by high vacuum evaporation and DC sputtering have been investigated. In the case of multilayer thin films the relative permeability at high frequencies is much improved, confirming the existence of a magnetostatic coupling between the 0.2 /spl mu/m thin magnetic layers. The alternating Ni-Fe/SiO/sub 2/ multilayer thin films are available for utilization as magnetoresistive heads and magnetoresistive sensors.
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