{"title":"射频放电的激光诊断","authors":"R. Gottscho","doi":"10.1364/lmd.1987.we1","DOIUrl":null,"url":null,"abstract":"Recent applications of laser spectroscopy to the study of plasma and plasma-surface processes are reviewed. Using laser-induced fluorescence and optogalvanic spectroscopy, measurements of concentration gradients, reaction probabilities, electric fields, and process end-points have helped to elucidate plasma-chemical mechanisms.","PeriodicalId":331014,"journal":{"name":"Topical Meeting on Lasers in Materials Diagnostics","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Laser Diagnostics of Radio Frequency Discharges\",\"authors\":\"R. Gottscho\",\"doi\":\"10.1364/lmd.1987.we1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Recent applications of laser spectroscopy to the study of plasma and plasma-surface processes are reviewed. Using laser-induced fluorescence and optogalvanic spectroscopy, measurements of concentration gradients, reaction probabilities, electric fields, and process end-points have helped to elucidate plasma-chemical mechanisms.\",\"PeriodicalId\":331014,\"journal\":{\"name\":\"Topical Meeting on Lasers in Materials Diagnostics\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Topical Meeting on Lasers in Materials Diagnostics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/lmd.1987.we1\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Topical Meeting on Lasers in Materials Diagnostics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/lmd.1987.we1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Recent applications of laser spectroscopy to the study of plasma and plasma-surface processes are reviewed. Using laser-induced fluorescence and optogalvanic spectroscopy, measurements of concentration gradients, reaction probabilities, electric fields, and process end-points have helped to elucidate plasma-chemical mechanisms.