一种基于氧化硅的单向记忆性光传感器

P. Ghasemi, M. Sharifi
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引用次数: 0

摘要

在这里,我们提出了一个非线性的,硅基的,光敏的忆阻器结构,氧化物作为有源层。在n-Si上生长一层薄薄的SiO2,构建了一种三层夹层的金属/SiO2/n-Si结构。以胶体银和溅射铜两种不同的电极作为离子源进行了研究,并考察了它们的行为。电流电压和脉冲响应特性被认为是黑暗和光明条件下的主要结果。通过±12v的扫频电压,在5v附近的记忆窗口获得5v和- 11v的设置和复位阈值电压。胶体银基样品显示突触可塑性变化(开/关比高达310)。相比之下,在Cu溅射样品中,几乎没有观察到突触可塑性。此外,该器件在可见光谱范围内对光脉冲的响应表现出约29%的电阻率变化。所制备的银基器件具有非线性单向忆阻器和光传感器的作用,基于离子在SiO2层内的迁移,具有峰值时间相关的塑性特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A photo sensor with one-direction memristive behavior based on silicon-oxide
Here, we proposed a nonlinear, silicon-based, and photosensitive memristor structure with oxide as the active layer. A three-layer sandwiched Metal/SiO2/n-Si structure was constructed using a thin SiO2 grown layer on n-Si. Two different electrodes, colloidal silver and sputtered copper, were studied as ion sources, and their behavior was examined. The current-voltage and pulse response characteristics were considered as the main outcomes under dark and light conditions. Set and reset threshold voltages of 5 V and -11 V were obtained with a memory window near 5 V by a sweeping voltage of ±12 V. Colloidal silver-based samples demonstrated a synaptic plasticity change (ON/OFF ratios up to 310). In contrast, in the Cu sputtered samples, nearly no synaptic plasticity was observed. Also, the device exhibited a resistivity change of about 29% in response to optical pulses in the visible spectrum range. The fabricated silver-based devices act like a nonlinear one-direction memristor and a photosensor based on the ions migration inside the SiO2 layer with spike-timing-dependent plasticity characters.
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