基于ingaas的热电子晶体管的室温工作

T. Moise, A. Seabaugh, E. Beam, Y. Kao, J. Randall
{"title":"基于ingaas的热电子晶体管的室温工作","authors":"T. Moise, A. Seabaugh, E. Beam, Y. Kao, J. Randall","doi":"10.1109/DRC.1993.1009610","DOIUrl":null,"url":null,"abstract":"Summary form only given. It is demonstrated that 300-K operation of an InGaAs-based HET (hot-electron transistor) can be achieved by further increasing the electron injection energy in combination with the use of a wide-bandgap base-collector isolation barrier. The characteristics of a device consisting of an InAlAs emitter, a 10-AA AlAs tunnel-barrier positioned at the emitter-base heterojunction, a 400-AA n+ InGaAs base region, and a 2500-AA InAlGaAs collector barrier are reported. The injected electrons are transported across the base region with over 80% efficiency, as measured in a common-base configuration. The maximum common-emitter current gain in this nonoptimized transistor is nearly four with an f/sub T/ of over 40 GHz and a base-collector breakdown voltage of 1.5 V. A systematic study of RHET (resonant tunneling HET) injector and collection properties indicates that the HET can operate at room temperature with a current gain on the order of 100. 300-K operation of a single-RHET, exclusive-NOR integrated circuit that is similar in design to the one demonstrated at 77 K by N. Yokoyama et al. (1985) is also shown. >","PeriodicalId":310841,"journal":{"name":"51st Annual Device Research Conference","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Room-temperature operation of InGaAs-based hot-electron transistors\",\"authors\":\"T. Moise, A. Seabaugh, E. Beam, Y. Kao, J. Randall\",\"doi\":\"10.1109/DRC.1993.1009610\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Summary form only given. It is demonstrated that 300-K operation of an InGaAs-based HET (hot-electron transistor) can be achieved by further increasing the electron injection energy in combination with the use of a wide-bandgap base-collector isolation barrier. The characteristics of a device consisting of an InAlAs emitter, a 10-AA AlAs tunnel-barrier positioned at the emitter-base heterojunction, a 400-AA n+ InGaAs base region, and a 2500-AA InAlGaAs collector barrier are reported. The injected electrons are transported across the base region with over 80% efficiency, as measured in a common-base configuration. The maximum common-emitter current gain in this nonoptimized transistor is nearly four with an f/sub T/ of over 40 GHz and a base-collector breakdown voltage of 1.5 V. A systematic study of RHET (resonant tunneling HET) injector and collection properties indicates that the HET can operate at room temperature with a current gain on the order of 100. 300-K operation of a single-RHET, exclusive-NOR integrated circuit that is similar in design to the one demonstrated at 77 K by N. Yokoyama et al. (1985) is also shown. >\",\"PeriodicalId\":310841,\"journal\":{\"name\":\"51st Annual Device Research Conference\",\"volume\":\"48 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1993-06-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"51st Annual Device Research Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.1993.1009610\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"51st Annual Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.1993.1009610","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

只提供摘要形式。研究表明,通过进一步提高电子注入能量并结合使用宽带隙基-集电极隔离势垒,可以实现基于ingaas的热电子晶体管(HET)的300 k工作。本文报道了一种由InAlAs发射极、位于发射基异质结处的10-AA AlAs隧道势垒、400-AA n+ InGaAs基区和2500-AA InAlGaAs集电极势垒组成的器件的特性。注入的电子以超过80%的效率在基极区域内传输,如在公共基极配置中测量的那样。这种非优化晶体管的最大共发射极电流增益接近4,f/sub /超过40 GHz,基极集电极击穿电压为1.5 V。通过对谐振隧穿式HET注入器和集电特性的系统研究表明,HET可以在室温下工作,电流增益可达100数量级。单rhet的300-K操作,排他性nor集成电路的设计与N. Yokoyama等人(1985)在77 K时演示的电路相似。>
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Room-temperature operation of InGaAs-based hot-electron transistors
Summary form only given. It is demonstrated that 300-K operation of an InGaAs-based HET (hot-electron transistor) can be achieved by further increasing the electron injection energy in combination with the use of a wide-bandgap base-collector isolation barrier. The characteristics of a device consisting of an InAlAs emitter, a 10-AA AlAs tunnel-barrier positioned at the emitter-base heterojunction, a 400-AA n+ InGaAs base region, and a 2500-AA InAlGaAs collector barrier are reported. The injected electrons are transported across the base region with over 80% efficiency, as measured in a common-base configuration. The maximum common-emitter current gain in this nonoptimized transistor is nearly four with an f/sub T/ of over 40 GHz and a base-collector breakdown voltage of 1.5 V. A systematic study of RHET (resonant tunneling HET) injector and collection properties indicates that the HET can operate at room temperature with a current gain on the order of 100. 300-K operation of a single-RHET, exclusive-NOR integrated circuit that is similar in design to the one demonstrated at 77 K by N. Yokoyama et al. (1985) is also shown. >
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