M. F. Beug, T. Melde, J. Paul, U. Bewersdorff-Sarlette, M. Czernohorsky, V. Beyer, R. Hoffmann, K. Seidel, D. Lohr, L. Bach, R. Knoefler, A. Tilke
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Improvement of 48 nm TANOS NAND Cell Performance by Introduction of a Removable Encapsulation Liner
This paper presents charge trapping (CT) cells integrated with a sacrificial liner at the word line (WL) side wall which improves significantly the erase and retention characteristics, currently the main issues in CT memory devices.