用于亚毫米波放大器和混合信号应用的深度缩放E/ d模式gan - hemt

K. Shinohara, D. Regan, A. Corrion, D. Brown, I. Alvarado-Rodoriguez, M. Cunningham, C. Butler, A. Schmitz, S. Kim, B. Holden, D. Chang, V. Lee, P. Asbeck
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引用次数: 5

摘要

在本文中,我们报告了通过创新的器件缩放技术,如垂直缩放AlN/GaN/AlGaN双异质结(DH) HEMT外延结构,MBE再生的低电阻n+-GaN欧姆触点,以及可制造的20纳米自校准侧壁栅极工艺,实现了最先进的GaN基HEMT高频性能。工程设计的顶层阻挡层结构使增强模式和耗尽模式(E/D)设备能够以创纪录的截止频率运行,同时保持约翰逊质量曲线(JFoM)击穿性能。此外,E/ d模式器件采用全外延再生技术进行单片集成,并成功演示了DCFL环形振荡器电路。深度缩放的E/ d模式gan - hemt具有前所未有的高频和高击穿特性组合,在亚毫米波功率放大器、超线性混频器和增加输出功率的数模转换器等电路应用中具有实际优势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Deeply-Scaled E/D-Mode GaN-HEMTs for Sub-mm-Wave Amplifiers and Mixed-Signal Applications
In this paper, we report state-of-the-art high-frequency performance of GaN-based HEMTs achieved through innovative device scaling technologies such as vertically-scaled AlN/GaN/AlGaN double-heterojunction (DH) HEMT epitaxial structure, low-resistance n+-GaN ohmic contacts regrown by MBE, and manufacturable 20-nm self-aligned sidewall gate process. Engineering top barrier layer structure enabled both enhancement- and depletion-mode (E/D) device operations with record cutoff frequencies while maintaining Johnson figure of merit (JFoM) breakdown performance. Furthermore, E/D-mode devices were monolithically integrated using a full epitaxial regrowth technique with a successful demonstration of DCFL ring oscillator circuits. Deeply-scaled E/D-mode GaN-HEMTs with an unprecedented combination of high-frequency and high-breakdown characteristics offer practical advantages in circuit applications such as sub-millimeter-wave power amplifiers, ultra-linear mixers, and increased output power digital-to-analog converters.
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