高迁移率有机薄膜晶体管与光刻图像化顶部触点

U. Zschieschang, N. H. Hansen, J. Pflaum, Tatsuya Yamamoto, K. Takimiya, H. Kuwabara, M. Ikeda, T. Sekitani, T. Someya, H. Klauk
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引用次数: 0

摘要

由于光刻的大面积性能和高分辨率,它是用于显示和电路应用的并五苯薄膜晶体管(tft)的首选图像化方法[1,2]。由于并五苯薄膜的形态对溶剂和热非常敏感[3,4],源/漏极触点的光刻图像化理想地在并五苯沉积之前进行,这解释了对底部触点(共面)TFT结构的普遍偏好。然而,正如实验[5]和模拟[6,7]所显示的那样,底部接触TFT结构比顶部接触(交错)结构具有更大的接触电阻,这意味着对于相同的通道长度,顶部接触TFT有望比底部接触TFT提供更大的跨导和更高的截止频率。在这里,我们报道了通过普通光刻和湿法蚀刻(使用普通溶剂、光刻剂和蚀刻剂)制作的具有Au顶部触点的有机tft,其场效应迁移率(0.4 cm2/Vs)和通/关电流比(107)类似于优化的底部触点五苯tft[1,2,5]。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High-mobility organic thin-film transistors with photolithographically patterned top contacts
Due to its large-area capability and high resolution, photolithography is the preferred patterning method for pentacene thin-film transistors (TFTs) for display and circuit applications [1,2]. Since the morphology of thin pentacene films is very sensitive to solvents and heat [3,4], the photolithographic patterning of the source/drain contacts is ideally performed prior to the pentacene deposition, which explains the general preference for the bottom-contact (coplanar) TFT structure. However, as experiments [5] and simulations [6,7] have shown, the bottom-contact TFT structure is associated with substantially larger contact resistance than the top-contact (staggered) structure, which means that for the same channel length, top-contact TFTs are expected to provide larger transconductance and higher cutoff frequency than bottom-contact TFTs. Here we report on organic TFTs with Au top contacts patterned by ordinary photolithography and wet etching (using common solvents, photoresists, and etchants) having field-effect mobilities (0.4 cm2/Vs) and on/off current ratios (107) similar to those of optimized bottom-contact pentacene TFTs [1,2,5].
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