G. Wohl, C. Parry, Erich Kasper, M. Jutzi, Manfred Berroth
{"title":"集成在硅衬底上用于光纤链路的SiGe引脚光电探测器","authors":"G. Wohl, C. Parry, Erich Kasper, M. Jutzi, Manfred Berroth","doi":"10.1109/ISSCC.2003.1234341","DOIUrl":null,"url":null,"abstract":"100% Ge pin-photodetectors grown on SiGe strain relaxed buffer (SRB) layers are presented, For integrated detectors the SRB layer growth as well as the subsequent SiGe photodiode technology processing must be compatible with standard CMOS technology. DC photoresponsivities of 145 mA/W at 1.3 /spl mu/m and 25 mA/W at 1.55 /spl mu/m can be achieved. In first experiments the 100% Ge pin-photodetector exhibits an RC limited 3-dB opto-electrical bandwidth of 0.9 GHz.","PeriodicalId":171288,"journal":{"name":"2003 IEEE International Solid-State Circuits Conference, 2003. Digest of Technical Papers. ISSCC.","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-02-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"SiGe pin-photodetectors integrated on silicon substrates for optical fiber links\",\"authors\":\"G. Wohl, C. Parry, Erich Kasper, M. Jutzi, Manfred Berroth\",\"doi\":\"10.1109/ISSCC.2003.1234341\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"100% Ge pin-photodetectors grown on SiGe strain relaxed buffer (SRB) layers are presented, For integrated detectors the SRB layer growth as well as the subsequent SiGe photodiode technology processing must be compatible with standard CMOS technology. DC photoresponsivities of 145 mA/W at 1.3 /spl mu/m and 25 mA/W at 1.55 /spl mu/m can be achieved. In first experiments the 100% Ge pin-photodetector exhibits an RC limited 3-dB opto-electrical bandwidth of 0.9 GHz.\",\"PeriodicalId\":171288,\"journal\":{\"name\":\"2003 IEEE International Solid-State Circuits Conference, 2003. Digest of Technical Papers. ISSCC.\",\"volume\":\"11 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-02-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2003 IEEE International Solid-State Circuits Conference, 2003. Digest of Technical Papers. ISSCC.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSCC.2003.1234341\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2003 IEEE International Solid-State Circuits Conference, 2003. Digest of Technical Papers. ISSCC.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSCC.2003.1234341","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
SiGe pin-photodetectors integrated on silicon substrates for optical fiber links
100% Ge pin-photodetectors grown on SiGe strain relaxed buffer (SRB) layers are presented, For integrated detectors the SRB layer growth as well as the subsequent SiGe photodiode technology processing must be compatible with standard CMOS technology. DC photoresponsivities of 145 mA/W at 1.3 /spl mu/m and 25 mA/W at 1.55 /spl mu/m can be achieved. In first experiments the 100% Ge pin-photodetector exhibits an RC limited 3-dB opto-electrical bandwidth of 0.9 GHz.