Pb1-xSnxSe外延薄膜的光电二极管

Ch. D. Jalilova, A. Aliyev, N. V. Faradjev, Sh. M. Alekperova
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引用次数: 0

摘要

研究了用分子束缩合法(MBC)制备的掺杂镓(Ga)的Pb1-xSnxSe(0.03小于等于x小于等于0.07)外延膜(NGaO,5l at%)的电学、光学和光电特性。建立了从非直接跃迁中规定带间吸收边,计算了带隙值(Eg)和带隙温度系数。确定了金属- Pb1-xSnxSe光电二极管结构的制备条件,分析了金属- Pb1-xSnxSe结构的容量温度依赖性。所获得的光电二极管的电流电压和容量电压特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photodiodes based on Pb1-xSnxSe epitaxial films
The features of the electrical, optical and photoelectric properties of gallium (Ga) doped Pb1-xSnxSe (0,03 less than or equal to x less than or equal to 0,07) epitaxial films (NGaO,5l at%) obtained by the molecular beam condensation method (MBC) are investigated. It is established that the interband absorption edge are stipulated from nondirect transition, the value of band gap (Eg), temperature coefficient of Eg are calculated. The conditions of preparing metal - Pb1-xSnxSe photodiode structures are determined and capacity temperature dependence of metal - Pb1-xSnxSe structure are analysed. The current-voltage and capacity-voltage characteristics of the obtained photodiodes.
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