利用田口L27正交阵列优化MQW soi横向PIN光电二极管的响应性

P. Susthitha Menon, S. K. Tasirin, I. Ahmad, S. Fazlili Abdullah, P. R. Apte
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引用次数: 1

摘要

采用SiGe/Si多层量子阱(MQW)的基于绝缘体上硅(SOI)的侧向PIN光电二极管适用于近红外范围内的传感和光纤通信应用。本文的目的是利用田口L27正交阵列对该装置的工艺参数进行优化。确定了5个器件工艺参数和2个器件噪声因素,使虚拟器件设计对所选制造参数的变化不敏感。优化后器件的响应度为0.33 A/W,器件的本征区长度为6 μm,光吸收层厚度为0.505 μm,入射光功率为0.5 mW/cm2,偏置电压为3.5 V, SOI层厚度为0.5 μm。与之前的工作相比,设备的响应性提高了27%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi's L27 orthogonal array
Silicon-on-insulator (SOI)-based lateral PIN photodiodes using SiGe/Si multilayer quantum wells (MQW) are suitable for applications in the near-infrared range both for sensing and optical fiber communication application. The objective of this paper is to optimize the process parameters for such a device using Taguchi's L27 orthogonal array. Five device process parameters and two device noise factors were identified to make the virtual device design insensitive to variation in the selected fabrication parameters. The results obtained for responsivity after the optimization approach was 0.33 A/W for the optimized device with intrinsic region length of 6 μm, photo-absorption layer thickness of 0.505 μm, incident optical power of 0.5 mW/cm2, bias voltage of 3.5 V and SOI layer thickness of 0.5 μm. The percentage of improvement for the device's responsivity is 27% as compared to the previous work.
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