基于锑化物的高速电子学:晶体管的视角

C. Bolognesi
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引用次数: 10

摘要

长期以来,含III-V化合物的锑被认为在毫米波频率下具有高速应用前景。它们的吸引力部分来自于在含砷和/或含磷化合物中添加锑所提供的异质结构设计的灵活性。锑化物异质结构的一个核心设计特征是交错的“ii型”带线的存在,我们考虑了这种特殊的线对InAs/AlSb量子阱hfet、PnP AlSb/InAs/AlSb双异质结双极晶体管(dhbt)和InP/GaAsSb/InP NpN dhbt的影响。尽管含Sb异质结构器件到目前为止在很大程度上保持着实验室好奇心的地位,但InP/GaAsSb dhbt的最新发展表明,它们可能在不久的将来进入商业应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Antimonide-based high-speed electronics: a transistor perspective
Antimony containing III-V compounds have long been considered to be promising for high-speed applications at millimeter wave frequencies. Part of their attractiveness comes from the flexibility in heterostructure design afforded by the addition of antimony to arsenic and/or phosphorus containing compounds. A central design feature of antimonide heterostructures is the presence of a staggered "type-II" band line up, and we consider the implications of this special lineup for InAs/AlSb quantum well HFETs, PnP AlSb/InAs/AlSb double heterojunction bipolar transistors (DHBTs), and InP/GaAsSb/InP NpN DHBTs. Whereas Sb- containing heterostructure devices have so far largely maintained the status of laboratory curiosity, recent developments in InP/GaAsSb DHBTs suggest they may break into commercial applications in the very near future.
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