K. Toh, C. Chuang, T. Chen, J. Warnock, G. Li, K. Chin, T. Ning
{"title":"23ps /2.1 mW ECL栅极","authors":"K. Toh, C. Chuang, T. Chen, J. Warnock, G. Li, K. Chin, T. Ning","doi":"10.1109/ISSCC.1989.48265","DOIUrl":null,"url":null,"abstract":"Simulated output waveforms at 0.1, 0.3 and, 0.6-pF loading of a design optimized for a 0.3-pF nominal load are shown. An AC-coupled APD ECL (active-pull-down emitter-coupled-logic) gate with significantly improved gate delay in the low-power (1-2 mW) regime is described. Unloaded gate delays of 23 and 35 ps at 2.1 and 1.1-mW/gate power, respectively, were demonstrated in a bipolar technology using a double-poly, self-aligned process with emitter width of 0.8 mu m (mask). The device cross-section is presented along with an SEM (scanning electron microscopy) micrograph of the basic gate used in the ring oscillator.<<ETX>>","PeriodicalId":385838,"journal":{"name":"IEEE International Solid-State Circuits Conference, 1989 ISSCC. Digest of Technical Papers","volume":"695 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1989-02-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"16","resultStr":"{\"title\":\"A 23 ps/2.1 mW ECL gate\",\"authors\":\"K. Toh, C. Chuang, T. Chen, J. Warnock, G. Li, K. Chin, T. Ning\",\"doi\":\"10.1109/ISSCC.1989.48265\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Simulated output waveforms at 0.1, 0.3 and, 0.6-pF loading of a design optimized for a 0.3-pF nominal load are shown. An AC-coupled APD ECL (active-pull-down emitter-coupled-logic) gate with significantly improved gate delay in the low-power (1-2 mW) regime is described. Unloaded gate delays of 23 and 35 ps at 2.1 and 1.1-mW/gate power, respectively, were demonstrated in a bipolar technology using a double-poly, self-aligned process with emitter width of 0.8 mu m (mask). The device cross-section is presented along with an SEM (scanning electron microscopy) micrograph of the basic gate used in the ring oscillator.<<ETX>>\",\"PeriodicalId\":385838,\"journal\":{\"name\":\"IEEE International Solid-State Circuits Conference, 1989 ISSCC. Digest of Technical Papers\",\"volume\":\"695 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1989-02-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"16\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE International Solid-State Circuits Conference, 1989 ISSCC. Digest of Technical Papers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSCC.1989.48265\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE International Solid-State Circuits Conference, 1989 ISSCC. Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSCC.1989.48265","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Simulated output waveforms at 0.1, 0.3 and, 0.6-pF loading of a design optimized for a 0.3-pF nominal load are shown. An AC-coupled APD ECL (active-pull-down emitter-coupled-logic) gate with significantly improved gate delay in the low-power (1-2 mW) regime is described. Unloaded gate delays of 23 and 35 ps at 2.1 and 1.1-mW/gate power, respectively, were demonstrated in a bipolar technology using a double-poly, self-aligned process with emitter width of 0.8 mu m (mask). The device cross-section is presented along with an SEM (scanning electron microscopy) micrograph of the basic gate used in the ring oscillator.<>