质子辐照剂量对铂邻近吸光局部寿命控制功率二极管性能的影响

B.D. Han, D. Hu, S. Xie, Y. Jia, B. Kang
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引用次数: 0

摘要

基于质子辐照引起的空位缺陷对铂的邻近吸收,获得了局部铂掺杂。它被用作大功率二极管的局部寿命控制技术。研究了电活性Pt浓度cts与辐照缺陷浓度Cv的理论依赖关系。测量了二极管的反向性能参数。它们是辐照剂量的函数。在低质子辐照剂量下,随着辐照剂量的增加,辐照缺陷对铂的吸收量增加。这样可以提高设备的性能。但当质子辐照剂量足够大时,吸积铂的峰值浓度趋于饱和。此外,对于深结器件,高剂量辐照带来的副作用会降低铂的吸集效率,在高辐照剂量下器件的性能会退化。在理论研究的基础上,改进了器件结构和制造工艺,获得了更高的峰值浓度。回收速度进一步提高
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of Proton Irradiation dose on the Performance of Local Lifetime Controlled Power Diode with Proximity Gettering of Platinum
Based on proximity gettering of platinum by vacancy defects which are induced by proton irradiation, local platinum doping is obtained. It is used as a local lifetime control technology in high-power diodes. The theoretical dependence of electrical active Pt concentration Cpts on irradiation induced defects concentration Cv is also studied. The diodes' reverse performance parameters are measured. They are functions of irradiation dose. For low proton irradiation dose, the gettered quantities of platinum by irradiation induced defects are enhanced when the irradiation dose increases. This can improve the performances of the device. But when the proton irradiation dose is high enough, the peak concentration of gettered platinum tends saturation. Further more, for deep junction device, the side effect brought by high dose irradiation will decrease the platinum gettering efficiency and the performances of the device degenerated under higher irradiation dose. On the base of theoretical study, we improved the device structure and manufacture process, a higher peak concentration is obtained. The recovery speed has been improved further
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