MoS2纳米带mosfet的隧穿衰减和漏电流

Ivan Prevaric, M. Matić, M. Poljak
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引用次数: 0

摘要

利用从头算哈密顿量和基于格林函数的量子输运模拟,研究了准一维二硫化钼纳米带(MoS2NR)场效应管的off态漏电流。计算了这些器件的复杂带结构,得到了带隙内随能量变化的隧道衰减。我们使用势垒下(UTB)和势垒顶(ToB)弹道模型,研究了亚20nm长和亚3nm宽的MoS2NR场效应管的关闭状态泄漏的隧道成分。我们报告说,使用抛物线近似衰减显着高估了关闭状态泄漏。此外,我们证明了所有MoS2NR fet都表现出良好的隧道抑制作用,这是由于高衰减,即使在最短的器件中,nfet的off状态泄漏低于16.5 nA/μm, pfet的off状态泄漏低于22 nA/μm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Tunneling Attenuation and Leakage Current in MoS2 Nanoribbon MOSFETs
We study the OFF-state leakage current in quasi-one-dimensional MoS2 nanoribbon (MoS2NR) FETs using ab initio Hamiltonians and quantum transport simulations based on Green’s functions. Complex band structure is computed for these devices and the energy-dependent tunneling attenuation inside the bandgap is obtained. We investigate the tunneling component of the OFF-state leakage for sub-20 nm long and sub-3 nm wide MoS2NR FETs, using the under-the-barrier (UTB) and top-of-the-barrier (ToB) ballistic models. We report that using the parabolically-approximated attenuation overestimates the OFF-state leakage significantly. Furthermore, we demonstrate that all MoS2NR FETs show good tunneling suppression due to high attenuation even for the shortest devices where the OFF-state leakage is under 16.5 nA/μm for nFETs and lower than 22 nA/μm for pFETs.
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