微波频率下噪声的光激活:尺度砷化镓HEMT的研究

A. Caddemi, E. Cardillo, G. Crupi
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引用次数: 9

摘要

本文对砷化镓高电子迁移率晶体管(HEMT)的微波噪声进行了实验研究。通过在可见光范围内的激光照射,实现了噪声的光激活。器件栅极长度为0.25 μm,栅极宽度为100 ~ 200 ~ 300 μm。在2-18 GHz频率范围内,分别在黑暗条件和连续波光照射下测量了其直流特性、线性散射和噪声参数。先前的结果表明,在照明条件下,对上述所有测量参数都有显著的影响,特别关注噪声性能。因此,作者通过提取每个HEMT的噪声温度电路模型,从本征噪声源的角度研究了这种光激活噪声的来源。此外,利用基于P、R和C系数以及K g、K R和K C系数的噪声模型公式,揭示了光激发噪声对器件性能影响的关键方面。可以观察到,最小噪声系数的降低可归因于噪声系数R,该系数与栅极噪声源有关,而栅极噪声源受到与光照射相关的电荷产生的强烈影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Light activation of noise at microwave frequencies: a study on scaled gallium arsenide HEMT's
This study is focused on the experimental investigation of noise at microwave frequencies for scaled gallium arsenide high-electron-mobility transistor's (HEMT's). The light activation of noise has been achieved by laser exposure in the visible range. The devices have 0.25 μm gate length and 100–200–300 μm gate widths. Their DC characteristics, linear scattering and noise parameters were measured both in dark condition and under continuous wave light exposure in the 2–18 GHz frequency range. Previous results had shown a remarkable influence on all the above-measured parameters under illumination, with a special concern for the noise performance. Therefore, the authors investigated the origin of this light-activated noise in terms of the intrinsic noise sources, by extracting a noise temperature circuit model for each HEMT.In addition, the noise model formulation based on the P, R and C as well as the K g, K r and K c coefficients is used to enlighten the key aspects of the optically activated noise on the device performance. It is observed that the degradation of the minimum noise figure can be attributed to the noise coefficient R, related to the gate noise source that is strongly affected by the charge generation related to light exposure.
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