用于65纳米互补金属氧化物半导体技术的x波段接收器的两级电流复用变增益低噪声放大器

Mohammad Reza Nikbakhsh, E. Abiri, Hossein Ghasemian, M. Salehi
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引用次数: 8

摘要

在本研究中,设计了一个工作在X波段的可变增益低噪声放大器(VG-LNA),并在65nm互补金属氧化物半导体技术下进行了仿真。提出的VG-LNA采用两级结构。此外,电流复用技术可以在不消耗额外功率的情况下获得更高的增益。当片上电压(vcnt)改变时,增益连续且几乎线性变化。最高增益为27.8 dB,随着控制电压的增加,增益几乎可以线性连续地降低到8.3 dB。在10ghz时,S11的最小值为−28.2 dB。在工作频率范围内,NF <2.75 dB;NF min = 1.8 dB。三阶截距点最大值为2.03 dBm,且始终大于−10.1 dBm。与其他同类结构相比,该结构的基本优点是不仅关键参数保持不变而增益降低,而且将V / t的工作范围从0.3 V扩大到V / d,从而将增益控制范围扩大到19.5 dB。此外,这些结果是在所提出的VG-LNA从1.2 V仅吸收3.9 mA的情况下实现的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Two-stage current-reused variable-gain low-noise amplifier for X-band receivers in 65 nm complementary metal oxide semiconductor technology
In this study, a variable gain low noise amplifier (VG-LNA) working at X band is designed and simulated in 65 nm complementary metal oxide semiconductor technology. A two-stage structure is used in the proposed VG-LNA. Besides, the current-reused technique causes a higher gain without consuming extra power. As an on-chip voltage ( V cnt ) is changed, the gain continuously and almost linearly varies. The highest gain is 27.8 dB that can be reduced to 8.3 dB almost linearly and continuously as the control voltage is increased. The lowest value of S11 is −28.2 dB at 10 GHz. Also, NF is <2.75 dB at the operating frequency range; while NF min  = 1.8 dB. The highest value of third-order intercept point is 2.03 dBm that always remain larger than −10.1 dBm. The basic advantage of this structure in comparison with other similar works is that not only the key parameters remain fixed with reduction of gain, but also the operation range of V cnt is widened from 0.3 V to V dd in order to extend the gain control range to 19.5 dB. Moreover, these results are achieved in a situation that the proposed VG-LNA draws only 3.9 mA from a 1.2 V.
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