基于氧化铪的ReRAM结构中导电丝生长和断裂的研究

E. Ganykina, A. Rezvanov, Y. Gornev
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引用次数: 1

摘要

由于规模限制和散热困难,神经形态计算已被提出作为传统数字计算的一个极好的替代方案。同时,神经形态计算对存储器提出了特殊的要求,如高速、耐用、兼容CMOS技术等。ReRAM完全满足这些要求。因此,本工作的目的是更好地了解金属样细丝在ReRAM中的生长和断裂的物理特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of conductive filament growth and rupture in ReRAM structures based on hafnium oxide
Neuromorphic computing has been raised as an excellent alternative to conventional digital computing due to scaling limits and heat removal difficulties. At the same time, neuromorphic computing makes special memory requirements, such as high-speed, durability, compatibility with CMOS technology. ReRAM meets these requirements perfectly. Therefore, the goal of this work is to better understand the physics of growth and rupture of metal-like filament in ReRAM.
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