纳米互连中表面粗糙度散射及其对电导率退化的影响分析

R. Deng, S. Dunham
{"title":"纳米互连中表面粗糙度散射及其对电导率退化的影响分析","authors":"R. Deng, S. Dunham","doi":"10.1109/IITC.2005.1499958","DOIUrl":null,"url":null,"abstract":"We use a quantum mechanical calculation of momentum loss rates as function of spatial frequency of surface roughness to identify which frequencies contribute most strongly to conductivity degradation. We combine these calculations with surface roughness spectrum from atomic step model matched to AFM data. We find that roughness with period on the order of 300 nm gives greatest contribution to resistance increase, but that scattering from typical Cu surfaces can be expected to be nearly specular. We attribute apparent surface scattering to adhesion/barrier layer properties rather than interface or surface roughness.","PeriodicalId":156268,"journal":{"name":"Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005.","volume":"56 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Analysis of surface roughness scattering and its contribution to conductivity degradation in nanoscale interconnects\",\"authors\":\"R. Deng, S. Dunham\",\"doi\":\"10.1109/IITC.2005.1499958\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We use a quantum mechanical calculation of momentum loss rates as function of spatial frequency of surface roughness to identify which frequencies contribute most strongly to conductivity degradation. We combine these calculations with surface roughness spectrum from atomic step model matched to AFM data. We find that roughness with period on the order of 300 nm gives greatest contribution to resistance increase, but that scattering from typical Cu surfaces can be expected to be nearly specular. We attribute apparent surface scattering to adhesion/barrier layer properties rather than interface or surface roughness.\",\"PeriodicalId\":156268,\"journal\":{\"name\":\"Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005.\",\"volume\":\"56 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-06-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IITC.2005.1499958\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC.2005.1499958","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

我们使用动量损失率的量子力学计算作为表面粗糙度空间频率的函数,以确定哪些频率对电导率退化贡献最大。我们将这些计算与原子阶跃模型与AFM数据相匹配的表面粗糙度谱相结合。我们发现周期约为300 nm的粗糙度对电阻增加的贡献最大,但典型Cu表面的散射可以预期为近镜面散射。我们将明显的表面散射归因于粘附/阻挡层的性质,而不是界面或表面粗糙度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of surface roughness scattering and its contribution to conductivity degradation in nanoscale interconnects
We use a quantum mechanical calculation of momentum loss rates as function of spatial frequency of surface roughness to identify which frequencies contribute most strongly to conductivity degradation. We combine these calculations with surface roughness spectrum from atomic step model matched to AFM data. We find that roughness with period on the order of 300 nm gives greatest contribution to resistance increase, but that scattering from typical Cu surfaces can be expected to be nearly specular. We attribute apparent surface scattering to adhesion/barrier layer properties rather than interface or surface roughness.
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