低压MOCVD制备的InGaP/InGaAs骆驼栅n通道和p通道假晶调制掺杂场效应晶体管的高栅极导通电压

J. Tsai, King-Poul Zhu, Ying-Cheng Chu, S. Chiu
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引用次数: 1

摘要

作者展示并比较了高性能InGaP /InGaAs骆驼栅n通道和p通道/spl δ /掺杂伪晶调制掺场效应晶体管(pmodfet)的实验结果。对于n通道器件,由于骆驼状栅极区域的p-n耗尽以及InGaP/InGaAs异质结构中存在较大的导带不连续,测量到的栅极导通电压大于1.7 V。然而,由于InGaP/InGaAs异质结构中较大的价带不连续,p通道器件表现出大于2 V的导通电压。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High gate turn-on voltages of InGaP/InGaAs camel-gate n- and p-channel pseudomorphic modulation-doped field effect transistors prepared by low-pressure MOCVD
The authors demonstrate and compare the experimental results of the high-performance InGaP /InGaAs camel-gate n-channel and p-channel /spl delta/-doped pseudomorphic modulation-doped field effect transistors (pMODFETs). For the n-channel device, because of the p-n depletion in the camel-like gate region and the presence of large conduction band discontinuity at InGaP/InGaAs heterostructure, an extremely large gate turn-on voltage than 1.7 V is measured. However, the p-channel device exhibits a larger turn-on voltage than 2 V due to the relatively large valence band discontinuity at InGaP/InGaAs heterostructure.
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