21世纪的Gigascale integrated (GIS)

J. Meindl
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引用次数: 0

摘要

只提供摘要形式。集成超过10亿个晶体管和与单个硅芯片相关的互连或千兆级集成(GSI)的机会受到限制等级的限制,这些限制等级可以被编码为基础,材料,设备,电路和系统。这个层次的每一层都有理论和实践的限制。理论极限完全由物理原理决定。实际限制受到制造技术和市场的强烈影响,可以用最小特征尺寸、模具面积的平方根和封装效率(定义为每个最小特征面积的晶体管或组件数量)来描述。揭示GSI技术有效性的单一度量是芯片性能指数(CPI),其定义为每片晶体管数量(N)和相关功率延迟积(Pt/sub d/)的商,或者CPI=N/Pt/sub d/。从1960年到1990年,CPI增加了约10/sup 13/,预计从1990年到2020年将再增加10/sup 6/。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Gigascale integration (GIS) in the 21st century
Summary form only given. Opportunities for incorporation of more than one billion transistors and associated interconnections with a single silicon chip or for gigascale integration (GSI) are governed by a hierarchy of limits whose levels can be codified as fundamental, material, device, circuit, and system. Each level of this hierarchy includes both theoretical and practical limits. Theoretical limits are determined solely by physical principles. Practical limits are strongly influenced by manufacturing technology and markets and can be described in terms of the minimum feature size, the square root of die area, and the packing efficiency (defined as the number of transistors or components per minimum feature area). The singular metric that reveals the efficacy of a technology for GSI is the chip performance index (CPI) defined as the quotient of the number of transistors per chip (N) and the associated power-delay product (Pt/sub d/) or CPI=N/Pt/sub d/. The CPI increased by about 10/sup 13/ from 1960 to 1990 and is projected to increase by another factor of 10/sup 6/ from 1990 to 2020.<>
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