圆柱形硅纳米线栅极周围的电子迁移率:蒙特卡罗研究

M. Ossaimee, M. El‐Sabagh, D. Selim, S. Gamal
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引用次数: 2

摘要

利用蒙特卡罗模拟计算了门控硅纳米线中的电子迁移率,考虑了声子和表面粗糙度散射。利用Ando模型计算表面粗糙度散射率。散射率计算所需的本征能和本征函数由Schrödinger方程和泊松方程的自一致解确定。讨论了尺寸量子化和横向电场对电子迁移率的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electron mobility in gate all around cylindrical silicon nanowires: A Monte Carlo study
Electron mobility in gated silicon nanowires is calculated using a Monte Carlo simulation that considers phonon and surface roughness scattering. Surface roughness scattering rates are calculated using Ando's model. The eigenenergies and eigenfunctions required for scattering rate calculation are determined by self-consistent solution of the Schrödinger and Poisson equations. The effects of size quantization and transverse electric field on electron mobility are presented and discussed.
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