溶胶-凝胶法制备Cu掺杂ZnO薄膜的结构和光电分析

A. Istrate, V. Dediu, I. Mihalache, C. Romanițan, O. Tutunaru
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引用次数: 2

摘要

铜掺杂氧化锌薄膜,(1,3,5 at。通过溶胶-凝胶自旋镀膜技术合成了%)。本文的主要目的是研究铜掺杂对ZnO薄膜的形貌、组成、结构和光电性能的影响。为了实现上述目标,进行了扫描电子显微镜(SEM),能量色散X射线(EDX), X射线衍射(XRD),紫外可见技术和电流-电压(I-V)测量。SEM结果显示为多孔结构。EDX测定的Cu浓度分别为0.66%、3.73%和6.26%,与Cu理论浓度吻合较好。XRD分析表明,薄膜为纤锌矿结构的纳米氧化锌。光学测量结果表明,所有掺杂样品的平均光透射率从93%下降到76%,带隙值从3.20 eV下降到3.00 eV,这与Cu掺杂引起的缺陷的存在有关。已经获得了9.64Ω10-4 Ω-cm的电阻率值,这在电子学领域对于场效应晶体管是非常有前途的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
structural and opto-electrical analysis of Cu doped ZnO thin films by sol-gel method
Copper-doped zinc oxide thinfilms, (1, 3,5 at. %) have been synthesized via sol-gel spin coating technique. Main objectives of the reported -work are to investigate the effect of copper doping on morphology, compositional, structure and on opto-electrical properties of ZnO thin films. To achieve the mentioned objectives, Scanning Electron Microscopy (SEM), Energy Dispersive X-Ray (EDX), X- Ray Diffraction (XRD), UV-vis techniques and the current-voltage (I-V) measurements -were performed. SEM result show a porous morphology. The % Cu concentration, determined by EDX analysis, are 0.66%, 3.73% and 6.26% in good agreement with the Cu theoretical concentration. XRD analysis shows that the films are nanocrystalline zinc oxide with the wurtzite structure. From optical measurements, a significant decrease in average optical transmission from 93 to 76 % is observed for all doped samples and the band gap value decreased from 3.20 to 3.00 eV which are related to the presence of defects due to Cu incorporation. The resistivity value of 9.64Ω10-4 Ω-cm have been achieved -which is very promising in electronics for field effect transistors.
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