标准CMOS中垂直网状电容器的设计与表征

K. T. Christensen
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引用次数: 10

摘要

本文展示了如何在标准的数字CMOS工艺中制造出好的射频电容器。同样适用于二元加权开关电容器组的电容器表现出非常好的射频性能:在4.0 GHz时q值为57,密度为0.27 fF//spl mu/2, 2.2 /spl mu/m宽屏蔽单元电容器,6%的底层电容,优于3-5%的工艺变化,串联电感可以忽略。此外,还提出了一种简单而准确的方法,可以手工计算电容值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design and characterization of vertical mesh capacitors in standard CMOS
This paper shows how good RF capacitors can be made in a standard digital CMOS process. The capacitors which are also well suited for binary weighted switched capacitor banks show very good RF performance: Q-values of 57 at 4.0 GHz, a density of 0.27 fF//spl mu/2, 2.2 /spl mu/m wide shielded unit capacitors, 6% bottom plate capacitance, better than 3-5% process variation and negligible series inductance. Further, a simple yet accurate method is presented that allows hand calculation of the capacitance value.
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