染料激光质谱法监测烷基基准分子激光光化学

Topical Meeting on Lasers in Materials Diagnostics Pub Date : 1900-01-01 DOI:10.1364/lmd.1987.thd2

Y. Zhang, M. Stuke, R. Larciprete, E. Borsella

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引用次数: 1

摘要

金属有机化学气相沉积(MOCVD)是一种强大的技术，用于生成定义良好的金属和半导体层[1]。利用激光器将MOCVD扩展到Laser-MOCVD，可以获得选择性的面积生长([2]及相关文献)。采用紫外激光和al -烷基(如三异丁基铝(TIBA))作为气态有机金属前驱体，可以实现结构化铝膜的激光诱导沉积[3,4]。

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Excimer laser photochemistry of Al-alkyls monitored by dye laser mass spectroscopy

Metal Organic Chemical Vapor Deposition (MOCVD) is a powerful technique for the generation of well-defined layers of metals and semiconductors [1]. Extending MOCVD by the use of lasers to Laser-MOCVD, selective area growth can be obtained ([2] and references therein). Laser induced deposition of structured aluminum films can be achieved using UV lasers and Al-alkyls like triisobutylaluminum (TIBA) as gaseous organometallic precursor [3, 4].

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Topical Meeting on Lasers in Materials Diagnostics

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