展示了6h碳化硅在功率器件中的潜力

J. Palmour, J. Edmond, C. Carter
{"title":"展示了6h碳化硅在功率器件中的潜力","authors":"J. Palmour, J. Edmond, C. Carter","doi":"10.1109/DRC.1993.1009604","DOIUrl":null,"url":null,"abstract":"Summary form only given. Discusses the first vertical UMOS power MOSFETs ever reported in SiC, shows the highest gain 6H-SiC BJTs (bipolar junction transistors) and thyristors ever reported, and demonstrate the high-temperature operation of these devices. Vertical power MOSFETs fabricated in 6H-SiC with a UMOS design have specific on-resistances as low as 38 m Omega -cm/sup 2/ at a gate bias of +12 V. These devices can have current densities as high as 190 A/cm/sup 2/ (0.32 A/cm of gate periphery) and can dissipate a maximum power density of 5.4 kW/cm/sup 2/. SiC BJTs have been demonstrated up to 400 degrees C. The device structure used a reactive ion etched emitter with sintered Ni contacts to both the emitter and collector, and Al/Ti alloy contacts to the base. Four-layer structures have also been demonstrated in 6H-SiC, with p-n-p-n thyristors showing 100 V operation. >","PeriodicalId":310841,"journal":{"name":"51st Annual Device Research Conference","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"Demonstrating the potential of 6h-silicon carbide for power devices\",\"authors\":\"J. Palmour, J. Edmond, C. Carter\",\"doi\":\"10.1109/DRC.1993.1009604\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Summary form only given. Discusses the first vertical UMOS power MOSFETs ever reported in SiC, shows the highest gain 6H-SiC BJTs (bipolar junction transistors) and thyristors ever reported, and demonstrate the high-temperature operation of these devices. Vertical power MOSFETs fabricated in 6H-SiC with a UMOS design have specific on-resistances as low as 38 m Omega -cm/sup 2/ at a gate bias of +12 V. These devices can have current densities as high as 190 A/cm/sup 2/ (0.32 A/cm of gate periphery) and can dissipate a maximum power density of 5.4 kW/cm/sup 2/. SiC BJTs have been demonstrated up to 400 degrees C. The device structure used a reactive ion etched emitter with sintered Ni contacts to both the emitter and collector, and Al/Ti alloy contacts to the base. Four-layer structures have also been demonstrated in 6H-SiC, with p-n-p-n thyristors showing 100 V operation. >\",\"PeriodicalId\":310841,\"journal\":{\"name\":\"51st Annual Device Research Conference\",\"volume\":\"11 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1993-06-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"51st Annual Device Research Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.1993.1009604\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"51st Annual Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.1993.1009604","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8

摘要

只提供摘要形式。讨论了有史以来报道的第一个垂直UMOS功率mosfet,展示了有史以来报道的最高增益6H-SiC BJTs(双极结晶体管)和晶闸管,并演示了这些器件的高温操作。采用UMOS设计的6H-SiC制造的垂直功率mosfet在+12 V的栅极偏压下具有低至38 m ω -cm/sup 2/的特定导通电阻。这些器件的电流密度可高达190 A/cm/sup 2/(栅极外围0.32 A/cm),耗散的最大功率密度为5.4 kW/cm/sup 2/。SiC BJTs的温度可达400℃,器件结构采用反应离子蚀刻发射极,发射极和集电极均采用烧结Ni触点,基极采用Al/Ti合金触点。在6H-SiC中,四层结构也得到了证明,其中p-n-p-n晶闸管的工作电压为100 V。>
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Demonstrating the potential of 6h-silicon carbide for power devices
Summary form only given. Discusses the first vertical UMOS power MOSFETs ever reported in SiC, shows the highest gain 6H-SiC BJTs (bipolar junction transistors) and thyristors ever reported, and demonstrate the high-temperature operation of these devices. Vertical power MOSFETs fabricated in 6H-SiC with a UMOS design have specific on-resistances as low as 38 m Omega -cm/sup 2/ at a gate bias of +12 V. These devices can have current densities as high as 190 A/cm/sup 2/ (0.32 A/cm of gate periphery) and can dissipate a maximum power density of 5.4 kW/cm/sup 2/. SiC BJTs have been demonstrated up to 400 degrees C. The device structure used a reactive ion etched emitter with sintered Ni contacts to both the emitter and collector, and Al/Ti alloy contacts to the base. Four-layer structures have also been demonstrated in 6H-SiC, with p-n-p-n thyristors showing 100 V operation. >
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信