嵌套方差分量对半导体电气测试抽样的影响

David Potts, S. Hildreth, Binod Kumar G. Nair
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引用次数: 0

摘要

内联晶圆电气测试(WET)通过对整个晶圆的测试结构进行测量,提供了对半导体制造过程的早期了解。然而,解释这些数据可能具有挑战性。在许多情况下,在生产中只监视测试站点的一个样本。复杂的制造要求使问题进一步复杂化,因为一些操作是在给定晶圆的子区域内迭代执行的,而另一些操作是在整个晶圆上同时运行的,还有一些是批量应用于晶圆的。这导致了一种嵌套的变化结构,在这种结构下,不同的物理机制对地点到地点、晶圆到晶圆和批次到批次的变化表现出不同的敏感性。本文使用蒙特卡罗模拟来探讨这些分层方差成分对WET性能感知的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impacts of Nested Variance Components on Semiconductor Electrical Test Sampling
Inline wafer electrical testing (WET) offers an early read on semiconductor manufacturing processes via measurements taken on test structures placed throughout the wafer. Interpreting the data can be challenging, however. In many cases, only a sample of the test sites are monitored in production. Complex manufacturing requirements further complicate the problem because some operations are iteratively executed within subregions across a given wafer, while others are run on the entire wafer at once, and still others are applied to wafers in batches. This results in a nested variance structure under which different physical mechanisms exhibit varying sensitivities to site-to-site, wafer-to-wafer, and lot-to-lot variations. This article uses Monte Carlo simulations to explore the impacts these hierarchical variance components can exert on perceptions of WET performance.
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