CdZnTe晶圆的自动x射线测量制造应用研究

W. She, L. Q. Zhou, Q. Bo, R. Bytheway, O. Whear, P. Gin
{"title":"CdZnTe晶圆的自动x射线测量制造应用研究","authors":"W. She, L. Q. Zhou, Q. Bo, R. Bytheway, O. Whear, P. Gin","doi":"10.1109/ASMC.2018.8373142","DOIUrl":null,"url":null,"abstract":"Digital X-ray diffraction imaging (XRDI) and high-resolution X-ray diffraction (HRXRD) are used to analyse defects in a non-destructive way on commercially made (111) CdZnTe substrates. The X-ray tools automatically aligned, measured and analysed the samples. The XRDI images show clear differences between the CdZnTe substrates which correspond to high and low yield. HRXRD rocking curve data correlates with the presence of the defects seen in XRDI images. These results suggest that X-ray metrology is an essential tool for the production monitoring of CdZnTe substrates in an automated environment.","PeriodicalId":349004,"journal":{"name":"2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Manufacturing application study of CdZnTe wafers using automated X-ray metrology\",\"authors\":\"W. She, L. Q. Zhou, Q. Bo, R. Bytheway, O. Whear, P. Gin\",\"doi\":\"10.1109/ASMC.2018.8373142\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Digital X-ray diffraction imaging (XRDI) and high-resolution X-ray diffraction (HRXRD) are used to analyse defects in a non-destructive way on commercially made (111) CdZnTe substrates. The X-ray tools automatically aligned, measured and analysed the samples. The XRDI images show clear differences between the CdZnTe substrates which correspond to high and low yield. HRXRD rocking curve data correlates with the presence of the defects seen in XRDI images. These results suggest that X-ray metrology is an essential tool for the production monitoring of CdZnTe substrates in an automated environment.\",\"PeriodicalId\":349004,\"journal\":{\"name\":\"2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2018.8373142\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2018.8373142","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

采用数字x射线衍射成像(XRDI)和高分辨率x射线衍射(HRXRD)对市售(111)CdZnTe衬底缺陷进行了无损分析。x射线工具自动对准、测量和分析样品。XRDI图像显示了CdZnTe衬底的明显差异,对应于高收率和低收率。HRXRD摇摆曲线数据与XRDI图像中缺陷的存在相关。这些结果表明,x射线测量是在自动化环境中监测CdZnTe衬底生产的重要工具。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Manufacturing application study of CdZnTe wafers using automated X-ray metrology
Digital X-ray diffraction imaging (XRDI) and high-resolution X-ray diffraction (HRXRD) are used to analyse defects in a non-destructive way on commercially made (111) CdZnTe substrates. The X-ray tools automatically aligned, measured and analysed the samples. The XRDI images show clear differences between the CdZnTe substrates which correspond to high and low yield. HRXRD rocking curve data correlates with the presence of the defects seen in XRDI images. These results suggest that X-ray metrology is an essential tool for the production monitoring of CdZnTe substrates in an automated environment.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信