W. She, L. Q. Zhou, Q. Bo, R. Bytheway, O. Whear, P. Gin
{"title":"CdZnTe晶圆的自动x射线测量制造应用研究","authors":"W. She, L. Q. Zhou, Q. Bo, R. Bytheway, O. Whear, P. Gin","doi":"10.1109/ASMC.2018.8373142","DOIUrl":null,"url":null,"abstract":"Digital X-ray diffraction imaging (XRDI) and high-resolution X-ray diffraction (HRXRD) are used to analyse defects in a non-destructive way on commercially made (111) CdZnTe substrates. The X-ray tools automatically aligned, measured and analysed the samples. The XRDI images show clear differences between the CdZnTe substrates which correspond to high and low yield. HRXRD rocking curve data correlates with the presence of the defects seen in XRDI images. These results suggest that X-ray metrology is an essential tool for the production monitoring of CdZnTe substrates in an automated environment.","PeriodicalId":349004,"journal":{"name":"2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Manufacturing application study of CdZnTe wafers using automated X-ray metrology\",\"authors\":\"W. She, L. Q. Zhou, Q. Bo, R. Bytheway, O. Whear, P. Gin\",\"doi\":\"10.1109/ASMC.2018.8373142\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Digital X-ray diffraction imaging (XRDI) and high-resolution X-ray diffraction (HRXRD) are used to analyse defects in a non-destructive way on commercially made (111) CdZnTe substrates. The X-ray tools automatically aligned, measured and analysed the samples. The XRDI images show clear differences between the CdZnTe substrates which correspond to high and low yield. HRXRD rocking curve data correlates with the presence of the defects seen in XRDI images. These results suggest that X-ray metrology is an essential tool for the production monitoring of CdZnTe substrates in an automated environment.\",\"PeriodicalId\":349004,\"journal\":{\"name\":\"2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2018.8373142\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2018.8373142","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Manufacturing application study of CdZnTe wafers using automated X-ray metrology
Digital X-ray diffraction imaging (XRDI) and high-resolution X-ray diffraction (HRXRD) are used to analyse defects in a non-destructive way on commercially made (111) CdZnTe substrates. The X-ray tools automatically aligned, measured and analysed the samples. The XRDI images show clear differences between the CdZnTe substrates which correspond to high and low yield. HRXRD rocking curve data correlates with the presence of the defects seen in XRDI images. These results suggest that X-ray metrology is an essential tool for the production monitoring of CdZnTe substrates in an automated environment.