基于90nm t栅GaN HEMT技术的高效4-18 GHz GaN MMIC功率放大器

Shuoqi Chen, Vipan Kumar, Yu Cao
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引用次数: 1

摘要

本文介绍了一种基于Qorvo公司90nm t栅GaN HEMT技术的宽带功率放大器MMIC的设计和性能测试。该GaN技术的特点是峰值fT为145 GHz, PAE > 55%, 35 GHz时P3dB输出功率密度> 2.0W/mm。放大器设计采用非均匀分布式功率放大器(NDPA)架构,采用宽带边缘耦合1:4输出变压器,实现高效率和高功耗。该单级NDPA在4 - 18 GHz频段产生3 - 5.3 W的输出功率,在13 V电源电压下PAE为25.6 - 35.7%。大信号增益在低频带边缘7.7 dB和大部分频带10.2dB之间变化。同时,NDPA在同一频段内实现了12.0 - 14.5 dB的小信号增益。此外,在18 V电源电压下,测量到5.6 - 7.0 W的输出功率和21-34.2%的PAE。基于90nm GaN t栅HEMT技术的优势,与其他最先进的GaN ndpa相比,该设计为在相似频段工作的PAs建立了新的效率基准。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A High Efficiency 4–18 GHz GaN MMIC Power Amplifier based on 90nm T-gate GaN HEMT Technology
This paper describes the design and measured performance of a wideband power amplifier MMIC based on Qorvo's 90nm T-gate GaN HEMT technology. This GaN technology is characterized by a peak fT of 145 GHz, a PAE > 55%, and a P3dB output power density> 2.0W/mm at 35 GHz. The amplifier design utilizes the non-uniform distributed power amplifier (NDPA) architecture with an wideband edge coupling 1:4 output transformer to achieve high efficiency and power. This single-stage NDPA produces 3 – 5.3 W of output power over the 4 – 18 GHz band with a PAE of 25.6 – 35.7% at 13 V supply voltage. The large-signal gain varies between 7.7 dB at the low band edge and 10.2dB in most of the band. Meanwhile, the NDPA has achieved a small-signal gain of 12.0 – 14.5 dB over the same band. Additionally, 5.6 – 7.0 W of output power with 21–34.2% of PAE has been measured up to 18 V supply voltage. Based on the advantages of the 90nm GaN T-gate HEMT technology, the design has established new benchmarks of efficiency for PAs operating at similar band compared to other state-of-the-art GaN NDPAs.
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