弯角曲率半径对微加工单晶硅结构机械强度的影响

F. Pourahmadi, D. Gee, K. Petersen
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引用次数: 34

摘要

测量了典型膜片结构在尖角处具有不同曲率半径的装置的破裂压力。当压力施加到膜片的蚀刻侧时,与没有可测量曲率半径的设备相比,曲率半径小至0.2 μ m的设备的爆裂压力增加了50%以上。曲率半径为1.5 μ m的器件的破裂压力比用常规方法制造的器件高5倍。采用有限元子模型对试验结果进行了模拟,模型估计了(100)硅片在(110)方向上990 kpsi的断裂强度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effect of corner radius of curvature on the mechanical strength of micromachined single-crystal silicon structures
The burst pressure of typical diaphragm structures is measured for devices that have various radii of curvature at the sharp corner. When pressure is applied to the etched side of the diaphragm, burst pressure is increased by over 50% in devices with radii of curvature as little as 0.2 mu m compared to devices with no measurable radii of curvature. Devices with radii of curvature of 1.5 mu m have burst pressures that are 5* higher than those manufactured with customary methods. Finite element submodeling has been used to simulate the test results, and the models estimate the fracture strength of (100) silicon wafers at 990 kpsi in the (110) direction.<>
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