富铝III-V氧化物的透射电镜研究

Z. Liliental-Weber, M. Li, G.S. Li, C. Chang-Hasnain, E. Weber
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引用次数: 3

摘要

采用透射电子显微镜对AlAs湿式氧化的微观结构进行了表征。氧化后形成致密立方/spl γ /-Al/sub 2/O/sub 3/。少量Ga (x=0.1)的加入增加了氧化物的粒度。在氧化物与低Al含量层的界面处形成了较大的孔隙。氧化后砷在孔隙附近、界面及层表面均有富集。本研究表明,这种氧化物的性质可能会被富As的GaAs(类似于低温生长的GaAs)的性质所增强。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Transmission electron microscopy of Al-rich III-V oxides
Transmission electron microscopy was used for the characterization of microstructure of wet oxidation of AlAs. Dense cubic /spl gamma/-Al/sub 2/O/sub 3/ was formed with a substantial shrinking after oxidation. Addition of a small amount of Ga (x=0.1) increased granularity of the oxide. Large pores were formed at the interface between the oxide and the low Al content layer. Arsenic accumulation near these pores, the interface, as well at the layer surface was found after oxidation. This study showed that properties of this oxide might be enhanced by the properties of GaAs rich in As (similar to low-temperature-grown-GaAs).
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