低温下SiGe HBTs的直流和射频变异性

Hanbin Ying, Jeffrey W. Teng, George N. Tzintzarov, Anup P. Omprakash, Sunil G. Rao, U. Raghunathan, Adrian Ildefonso, Martin S. Fernandez, J. Cressler
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引用次数: 4

摘要

我们给出了在300k、78k和7k下商用90nm SiGe hbt的测量结果。数据显示,与300 K相比,78 K和7 K时SiGe HBTs的变异性增加。集电极电流、基极电流和直流电流增益(β)的变化在平均测量值附近从300 K时的5%增加到7 K时的50%。跨导(gm)变化从300 K时的0.6%增加到7 K时的5%。峰值fT变化从2.6%增加到7.1%,而低注入时fT从300 K时的1.8%增加到7 K时的24.9%。在78 K和7 K的较低注射水平下,观察到变异性增加,直流参数往往比射频参数有更大的变化。增加可变性的电路设计支持新兴的低温应用,如量子计算的影响进行了讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
DC and RF Variability of SiGe HBTs Operating Down to Deep Cryogenic Temperatures
We present measurement results of commercially-available 90-nm SiGe HBTs at 300 K, 78 K, and 7 K. The data reveal increased variability of SiGe HBTs at 78 K and 7 K compared to that at 300 K. The variation of collector current, base current, and DC current gain (β) increase from 5% at 300 K to 50% at 7 K around the average measured values. Transconductance (gm) variation increases from 0.6% at 300 K to 5% at 7 K. Peak fT variation increases from 2.6% to 7.1%, while the fT at low injection increases from 1.8% at 300 K to 24.9% at 7 K. Increased variability is observed at lower injection levels at 78 K and 7 K and DC parameters tend to have more variation than RF parameters. The implications of increased variability for circuit designs supporting emerging cryogenic applications such as quantum computing are discussed.
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