Antao Chen, F. I. Marti-Carrera, S. Garner, V. Chuyanov, W. Steier
{"title":"应用于光子器件的阴影掩膜氧反应离子蚀刻技术制备聚合物薄膜中的垂直锥体","authors":"Antao Chen, F. I. Marti-Carrera, S. Garner, V. Chuyanov, W. Steier","doi":"10.1364/otfa.1997.the.16","DOIUrl":null,"url":null,"abstract":"The taper structure is the key component of an on-chip mode size transformer for efficient fiber coupling. The taper provides a smooth transition between two waveguide sections with different mode sizes with minimum radiation loss. The tapered mode size transformer has become a standard approach for efficient fiber coupling with semiconductor lasers and amplifiers[1]. Various taper fabrication techniques are developed for semiconductor and LiNbO3 devices[2-5], but most of them are not applicable to polymer waveguides. Oxygen reactive ion etching is the primary method to etch a polymer film. For most polymer waveguides, the major part of fiber coupling loss is due to the mode size mismatch between the waveguide and fiber in the vertical direction, therefore a vertical taper is needed to reduce the fiber coupling loss. In this paper, a reactive ion etching (RIE) technique with a shadow mask is demonstrated. A similar technique has been reported for etching submicron tapers in InP with methane plasma[5]. Our approach can effectively create tapers several microns deep and a few millimeters long with oxygen plasma which is required for multilayer polymer waveguide structures.","PeriodicalId":378320,"journal":{"name":"Organic Thin Films for Photonics Applications","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Fabrication of vertical tapers in polymer thin films by oxygen reactive ion etching with a shadow mask for photonic device applications\",\"authors\":\"Antao Chen, F. I. Marti-Carrera, S. Garner, V. Chuyanov, W. Steier\",\"doi\":\"10.1364/otfa.1997.the.16\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The taper structure is the key component of an on-chip mode size transformer for efficient fiber coupling. The taper provides a smooth transition between two waveguide sections with different mode sizes with minimum radiation loss. The tapered mode size transformer has become a standard approach for efficient fiber coupling with semiconductor lasers and amplifiers[1]. Various taper fabrication techniques are developed for semiconductor and LiNbO3 devices[2-5], but most of them are not applicable to polymer waveguides. Oxygen reactive ion etching is the primary method to etch a polymer film. For most polymer waveguides, the major part of fiber coupling loss is due to the mode size mismatch between the waveguide and fiber in the vertical direction, therefore a vertical taper is needed to reduce the fiber coupling loss. In this paper, a reactive ion etching (RIE) technique with a shadow mask is demonstrated. A similar technique has been reported for etching submicron tapers in InP with methane plasma[5]. Our approach can effectively create tapers several microns deep and a few millimeters long with oxygen plasma which is required for multilayer polymer waveguide structures.\",\"PeriodicalId\":378320,\"journal\":{\"name\":\"Organic Thin Films for Photonics Applications\",\"volume\":\"15 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Organic Thin Films for Photonics Applications\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/otfa.1997.the.16\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Organic Thin Films for Photonics Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/otfa.1997.the.16","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fabrication of vertical tapers in polymer thin films by oxygen reactive ion etching with a shadow mask for photonic device applications
The taper structure is the key component of an on-chip mode size transformer for efficient fiber coupling. The taper provides a smooth transition between two waveguide sections with different mode sizes with minimum radiation loss. The tapered mode size transformer has become a standard approach for efficient fiber coupling with semiconductor lasers and amplifiers[1]. Various taper fabrication techniques are developed for semiconductor and LiNbO3 devices[2-5], but most of them are not applicable to polymer waveguides. Oxygen reactive ion etching is the primary method to etch a polymer film. For most polymer waveguides, the major part of fiber coupling loss is due to the mode size mismatch between the waveguide and fiber in the vertical direction, therefore a vertical taper is needed to reduce the fiber coupling loss. In this paper, a reactive ion etching (RIE) technique with a shadow mask is demonstrated. A similar technique has been reported for etching submicron tapers in InP with methane plasma[5]. Our approach can effectively create tapers several microns deep and a few millimeters long with oxygen plasma which is required for multilayer polymer waveguide structures.