在0.8 /spl mu/m的BiCMOS工艺中,使用三角电压扫描使钠离子减少100/spl倍的案例研究

L. Anderson, S. Parikh, S. Nagalingam, C. Haidinyak
{"title":"在0.8 /spl mu/m的BiCMOS工艺中,使用三角电压扫描使钠离子减少100/spl倍的案例研究","authors":"L. Anderson, S. Parikh, S. Nagalingam, C. Haidinyak","doi":"10.1109/IRWS.1995.493574","DOIUrl":null,"url":null,"abstract":"This case study shows how to use Triangular Voltage Sweep (TVS) to reduce Na and K in the backend of a triple-metal BiCMOS process from 10/sup 12/ ions/cm/sup 2/ to 10/sup 10/ ions/cm/sup 2/. TVS is compared to Bias Temperature Stress (BTS) techniques. While Capacitance-Voltage plots are good monitors for bulk contamination (metal, deposited oxide, etc.), data is presented which shows that TVS is superior for detecting surface-introduced mobile ions (photoresist, solvent strip, etc.). Process integration techniques and issues in the reduction of mobile ions are discussed. When TVS structures are put on product-like wafers, the mobile ions can be measured accurately and repeatably within 10 minutes of completing the process step-no alloy is required! Finally, the use of Ammonium Fluoride solutions to reduce the surface mobile ions are discussed.","PeriodicalId":355898,"journal":{"name":"IEEE 1995 International Integrated Reliability Workshop. Final Report","volume":"97 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-10-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"A case study in a 100/spl times/reduction in sodium ions in a 0.8 /spl mu/m BiCMOS process using triangular voltage sweep\",\"authors\":\"L. Anderson, S. Parikh, S. Nagalingam, C. Haidinyak\",\"doi\":\"10.1109/IRWS.1995.493574\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This case study shows how to use Triangular Voltage Sweep (TVS) to reduce Na and K in the backend of a triple-metal BiCMOS process from 10/sup 12/ ions/cm/sup 2/ to 10/sup 10/ ions/cm/sup 2/. TVS is compared to Bias Temperature Stress (BTS) techniques. While Capacitance-Voltage plots are good monitors for bulk contamination (metal, deposited oxide, etc.), data is presented which shows that TVS is superior for detecting surface-introduced mobile ions (photoresist, solvent strip, etc.). Process integration techniques and issues in the reduction of mobile ions are discussed. When TVS structures are put on product-like wafers, the mobile ions can be measured accurately and repeatably within 10 minutes of completing the process step-no alloy is required! Finally, the use of Ammonium Fluoride solutions to reduce the surface mobile ions are discussed.\",\"PeriodicalId\":355898,\"journal\":{\"name\":\"IEEE 1995 International Integrated Reliability Workshop. Final Report\",\"volume\":\"97 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-10-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE 1995 International Integrated Reliability Workshop. Final Report\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRWS.1995.493574\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE 1995 International Integrated Reliability Workshop. Final Report","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRWS.1995.493574","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

本案例研究展示了如何使用三角电压扫描(TVS)将三金属BiCMOS工艺后端的Na和K从10/sup 12/ ions/cm/sup 2/降低到10/sup 10/ ions/cm/sup 2/。TVS与偏置温度应力(BTS)技术进行了比较。虽然电容-电压图是大块污染(金属,沉积氧化物等)的良好监测仪,但数据显示TVS在检测表面引入的移动离子(光刻胶,溶剂条等)方面更优越。讨论了移动离子还原的工艺集成技术和问题。当TVS结构被放置在类似产品的晶圆上时,可以在完成工艺步骤的10分钟内精确和重复地测量移动离子-不需要合金!最后讨论了氟化铵溶液对降低表面移动离子的作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A case study in a 100/spl times/reduction in sodium ions in a 0.8 /spl mu/m BiCMOS process using triangular voltage sweep
This case study shows how to use Triangular Voltage Sweep (TVS) to reduce Na and K in the backend of a triple-metal BiCMOS process from 10/sup 12/ ions/cm/sup 2/ to 10/sup 10/ ions/cm/sup 2/. TVS is compared to Bias Temperature Stress (BTS) techniques. While Capacitance-Voltage plots are good monitors for bulk contamination (metal, deposited oxide, etc.), data is presented which shows that TVS is superior for detecting surface-introduced mobile ions (photoresist, solvent strip, etc.). Process integration techniques and issues in the reduction of mobile ions are discussed. When TVS structures are put on product-like wafers, the mobile ions can be measured accurately and repeatably within 10 minutes of completing the process step-no alloy is required! Finally, the use of Ammonium Fluoride solutions to reduce the surface mobile ions are discussed.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信