采用65nm CMOS工艺的超低漏电流无电阻电源轨ESD箝位电路

C. Yeh, M. Ker
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引用次数: 1

摘要

提出了一种以可控硅为主要ESD钳位器件,仅采用薄栅氧化物器件实现的无电阻电源轨ESD钳位电路,并在65nm 1V CMOS工艺上进行了验证。巧妙地利用栅极漏电流实现静电暂态检测电路中的等效电阻,可以在不使用实际电阻的情况下实现基于rc的静电暂态检测机制,从而减少I/O单元的布局面积。实验结果表明,在所设计的电源轨ESD箝位电路中,可控硅宽度为45μm的电源轨ESD箝位电路在ESD应力事件下可达到5kV HBM和400V MM的ESD水平,而在正常电路工作条件下,在25°C、1V偏置下,待机漏电流仅为1.43nA。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Resistor-less power-rail ESD clamp circuit with ultra-low leakage current in 65nm CMOS process
A resistor-less power-rail ESD clamp circuit realized with only thin gate oxide devices, and with SCR as main ESD clamp device, has been proposed and verified in a 65nm 1V CMOS process. Skillfully utilizing the gate leakage currents to realize the equivalent resistors in the ESD-transient detection circuit, the RC-based ESD-transient detection mechanism can be achieved without using an actual resistor to reduce the layout area in I/O cells. From the measured results, the proposed power-rail ESD clamp circuit with SCR width of 45μm can achieve 5kV HBM and 400V MM ESD levels under the ESD stress event, while consuming only a standby leakage current of 1.43nA at 25°C under the normal circuit operating condition with 1V bias.
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