升华分子束外延生长的Si:Er薄膜中与Er相关的发光

B. Andreev, Z. Krasilnik, D. I. Kryzhkov, V. P. Kuznetsov, E. Morozova, V. Shmagin, M. V. Stepikohova, A. Yablonskii
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引用次数: 0

摘要

采用分辨率低至0.5 cm-1的低温光致发光光谱技术研究了原始升华分子束外延(SMBE)工艺下Er3+离子引入硅晶体的中心内4f-壳层跃迁和产率。在SMBE Si:Er/Si结构中检测到的Er相关光活性中心根据其光谱特征进行分类。确定了SMBE Si:Er/Si结构特有的新型光学活性Er-1相关中心。证明了一种新型的Si:Er/Si结构,即在SMBE工艺中生长的具有增强发光效率的选择性掺铒多层结构。讨论了SMBE Si:Er/Si结构中能量向Er3+离子转移的特点,并与离子注入的Si:Er/Si结构进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Er-related luminescence in Si:Er epilayers grown with sublimation molecular-beam epitaxy
The intra-center 4f-shell transitions 4I13/2 yields 4I15/2 of Er3+ ion introduced into Si crystal under original Sublimation Molecular Beam Epitaxy (SMBE) process are investigated by low temperature photoluminescence spectroscopy with resolution down to 0.5 cm-1. Er-related optically active centers detected in SMBE Si:Er/Si structures are classified based on their spectroscopic features. The novel optically active Er- related center Er-1 specific for SMBE Si:Er/Si structures is identified. A novel type of Si:Er/Si structures namely selectively Er-doped multilayer structures with enhanced luminescence efficiency grown in SMBE process is demonstrated. The features of the energy transfer to Er3+ ions in SMBE Si:Er/Si structures as compared with ion implanted Si:Er/Si structures are discussed.
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