铜-银细间距互连:加工条件对互连质量的影响

Steffen Bickel, Shawon Sen, Jörg Meyer, I. Panchenko, M. Wolf
{"title":"铜-银细间距互连:加工条件对互连质量的影响","authors":"Steffen Bickel, Shawon Sen, Jörg Meyer, I. Panchenko, M. Wolf","doi":"10.1109/ESTC.2018.8546413","DOIUrl":null,"url":null,"abstract":"Cu-In fine pitch interconnects are a promising approach for low-temperature technologies in 3D heterogeneous integration. With decreasing structure sizes, the solder material is consumed within little joining durations. The resulting interconnection zone completely exists of intermetallic compounds (IMCs). Due to the unqiue properties of Cu-In-IMCs the interconnection quality of Cu-In fine-pitch interconnects can be affected in a quite tremendous manner when processing conditions are altered. In this work, we address the influence of the bonding duration, the bonding pressure as well as the storage time of as-plated Cu-In microbumps prior to the bonding process.","PeriodicalId":198238,"journal":{"name":"2018 7th Electronic System-Integration Technology Conference (ESTC)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Cu-In fine-pitch-interconnects: influence of processing conditions on the interconnection quality\",\"authors\":\"Steffen Bickel, Shawon Sen, Jörg Meyer, I. Panchenko, M. Wolf\",\"doi\":\"10.1109/ESTC.2018.8546413\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Cu-In fine pitch interconnects are a promising approach for low-temperature technologies in 3D heterogeneous integration. With decreasing structure sizes, the solder material is consumed within little joining durations. The resulting interconnection zone completely exists of intermetallic compounds (IMCs). Due to the unqiue properties of Cu-In-IMCs the interconnection quality of Cu-In fine-pitch interconnects can be affected in a quite tremendous manner when processing conditions are altered. In this work, we address the influence of the bonding duration, the bonding pressure as well as the storage time of as-plated Cu-In microbumps prior to the bonding process.\",\"PeriodicalId\":198238,\"journal\":{\"name\":\"2018 7th Electronic System-Integration Technology Conference (ESTC)\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 7th Electronic System-Integration Technology Conference (ESTC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ESTC.2018.8546413\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 7th Electronic System-Integration Technology Conference (ESTC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESTC.2018.8546413","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

Cu-In细间距互连是一种很有前途的3D异构集成低温技术。随着结构尺寸的减小,焊料的消耗在很小的连接时间内。金属间化合物(IMCs)的互连区完全存在。由于Cu-In- imcs的独特性能,当加工条件发生改变时,会对Cu-In- imcs的互连质量产生很大影响。在这项工作中,我们解决了键合时间,键合压力以及在键合过程之前镀Cu-In微凸点的储存时间的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Cu-In fine-pitch-interconnects: influence of processing conditions on the interconnection quality
Cu-In fine pitch interconnects are a promising approach for low-temperature technologies in 3D heterogeneous integration. With decreasing structure sizes, the solder material is consumed within little joining durations. The resulting interconnection zone completely exists of intermetallic compounds (IMCs). Due to the unqiue properties of Cu-In-IMCs the interconnection quality of Cu-In fine-pitch interconnects can be affected in a quite tremendous manner when processing conditions are altered. In this work, we address the influence of the bonding duration, the bonding pressure as well as the storage time of as-plated Cu-In microbumps prior to the bonding process.
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