{"title":"低功耗电子产品的制造技术挑战","authors":"Z. Lemnios","doi":"10.1109/VLSIT.1995.520833","DOIUrl":null,"url":null,"abstract":"SOI is an attractive technology option for low power, high performance semiconductors. A number of breakthroughs and developments are required to move the material into mainstream acceptance by manufacturers. It is too early to predict the future dominance of SOI technology. Next steps in the development of an SOI technology base are better understanding of how materials issues affect device/circuit operation, and which device design paradigms are best.","PeriodicalId":328379,"journal":{"name":"1995 Symposium on VLSI Technology. Digest of Technical Papers","volume":"58 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"14","resultStr":"{\"title\":\"Manufacturing technology challenges for low power electronics\",\"authors\":\"Z. Lemnios\",\"doi\":\"10.1109/VLSIT.1995.520833\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"SOI is an attractive technology option for low power, high performance semiconductors. A number of breakthroughs and developments are required to move the material into mainstream acceptance by manufacturers. It is too early to predict the future dominance of SOI technology. Next steps in the development of an SOI technology base are better understanding of how materials issues affect device/circuit operation, and which device design paradigms are best.\",\"PeriodicalId\":328379,\"journal\":{\"name\":\"1995 Symposium on VLSI Technology. Digest of Technical Papers\",\"volume\":\"58 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-06-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"14\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1995 Symposium on VLSI Technology. Digest of Technical Papers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIT.1995.520833\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1995 Symposium on VLSI Technology. Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.1995.520833","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Manufacturing technology challenges for low power electronics
SOI is an attractive technology option for low power, high performance semiconductors. A number of breakthroughs and developments are required to move the material into mainstream acceptance by manufacturers. It is too early to predict the future dominance of SOI technology. Next steps in the development of an SOI technology base are better understanding of how materials issues affect device/circuit operation, and which device design paradigms are best.