{"title":"用于微加工的等离子炬装置","authors":"O. Mostafa","doi":"10.1109/NRSC.1999.760948","DOIUrl":null,"url":null,"abstract":"The construction of a plasma torch device, which is suitable for ion etching and thinning applications has been described. The device consists of a stainless steel anode rod with a coaxial floating cylinder around it. The cylinder has an aperture on its surface for mechanical confinement of the discharge. The cathode target is placed opposing this aperture for micro machining with ion densities of the order of 160 mA/cm/sup 2/. N/sub 2/, Ar and He gases are tested using discharge voltages equal to 1.92, 2.3 and 1.56 KV respectively and at a pressure of 2.6/spl times/10/sup -4/ torr.","PeriodicalId":250544,"journal":{"name":"Proceedings of the Sixteenth National Radio Science Conference. NRSC'99 (IEEE Cat. No.99EX249)","volume":"37 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-02-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Plasma torch device for micro-machining applications\",\"authors\":\"O. Mostafa\",\"doi\":\"10.1109/NRSC.1999.760948\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The construction of a plasma torch device, which is suitable for ion etching and thinning applications has been described. The device consists of a stainless steel anode rod with a coaxial floating cylinder around it. The cylinder has an aperture on its surface for mechanical confinement of the discharge. The cathode target is placed opposing this aperture for micro machining with ion densities of the order of 160 mA/cm/sup 2/. N/sub 2/, Ar and He gases are tested using discharge voltages equal to 1.92, 2.3 and 1.56 KV respectively and at a pressure of 2.6/spl times/10/sup -4/ torr.\",\"PeriodicalId\":250544,\"journal\":{\"name\":\"Proceedings of the Sixteenth National Radio Science Conference. NRSC'99 (IEEE Cat. No.99EX249)\",\"volume\":\"37 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-02-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the Sixteenth National Radio Science Conference. NRSC'99 (IEEE Cat. No.99EX249)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/NRSC.1999.760948\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the Sixteenth National Radio Science Conference. NRSC'99 (IEEE Cat. No.99EX249)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NRSC.1999.760948","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Plasma torch device for micro-machining applications
The construction of a plasma torch device, which is suitable for ion etching and thinning applications has been described. The device consists of a stainless steel anode rod with a coaxial floating cylinder around it. The cylinder has an aperture on its surface for mechanical confinement of the discharge. The cathode target is placed opposing this aperture for micro machining with ion densities of the order of 160 mA/cm/sup 2/. N/sub 2/, Ar and He gases are tested using discharge voltages equal to 1.92, 2.3 and 1.56 KV respectively and at a pressure of 2.6/spl times/10/sup -4/ torr.