InAs/GaAs量子点生长中自组装过程的实时探测

T. Kudo, T. Inoue, T. Kita, O. Wada
{"title":"InAs/GaAs量子点生长中自组装过程的实时探测","authors":"T. Kudo, T. Inoue, T. Kita, O. Wada","doi":"10.1109/ICIPRM.2007.381184","DOIUrl":null,"url":null,"abstract":"Self-assembling process of InAs/GaAs quantum dots (QDs) has been investigated by analyzing reflection high-energy electron diffraction (RHEED) images. During the island formation, the chevron diffraction of the RHEED shows dramatic changes depending on the As pressure. The self-assembling process has been found to consist of four steps. Initially islands are preferentially covered by high-index facets, which transform into low-index surfaces as the growth proceeds, and then the islands are covered by stable low-index facets. In this growth step, the island size becomes uniform, because of the self-limited growth. In the next step, we found indium flow back from the islands into the wetting layer, which causes shrinkage of the island size as well as formation of giant islands. This indium flow back can be controlled by As pressure.","PeriodicalId":352388,"journal":{"name":"2007 IEEE 19th International Conference on Indium Phosphide & Related Materials","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-05-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Real Time Probing of Self-Assembling Process Steps in InAs/GaAs Quantum Dot Growth\",\"authors\":\"T. Kudo, T. Inoue, T. Kita, O. Wada\",\"doi\":\"10.1109/ICIPRM.2007.381184\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Self-assembling process of InAs/GaAs quantum dots (QDs) has been investigated by analyzing reflection high-energy electron diffraction (RHEED) images. During the island formation, the chevron diffraction of the RHEED shows dramatic changes depending on the As pressure. The self-assembling process has been found to consist of four steps. Initially islands are preferentially covered by high-index facets, which transform into low-index surfaces as the growth proceeds, and then the islands are covered by stable low-index facets. In this growth step, the island size becomes uniform, because of the self-limited growth. In the next step, we found indium flow back from the islands into the wetting layer, which causes shrinkage of the island size as well as formation of giant islands. This indium flow back can be controlled by As pressure.\",\"PeriodicalId\":352388,\"journal\":{\"name\":\"2007 IEEE 19th International Conference on Indium Phosphide & Related Materials\",\"volume\":\"20 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-05-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2007 IEEE 19th International Conference on Indium Phosphide & Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.2007.381184\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 IEEE 19th International Conference on Indium Phosphide & Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.2007.381184","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

通过分析反射高能电子衍射(RHEED)图像,研究了InAs/GaAs量子点(QDs)的自组装过程。在岛屿形成过程中,RHEED的v形衍射随As压力的变化而发生剧烈变化。发现自组装过程由四个步骤组成。最初,岛屿优先被高指数面覆盖,随着生长的进行,这些面转变为低指数面,然后岛屿被稳定的低指数面覆盖。在这个生长步骤中,由于自我限制的生长,岛屿的大小变得均匀。在下一步,我们发现铟从岛屿回流到湿润层,导致岛屿尺寸缩小,形成巨大的岛屿。这种铟回流可以通过As压力来控制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Real Time Probing of Self-Assembling Process Steps in InAs/GaAs Quantum Dot Growth
Self-assembling process of InAs/GaAs quantum dots (QDs) has been investigated by analyzing reflection high-energy electron diffraction (RHEED) images. During the island formation, the chevron diffraction of the RHEED shows dramatic changes depending on the As pressure. The self-assembling process has been found to consist of four steps. Initially islands are preferentially covered by high-index facets, which transform into low-index surfaces as the growth proceeds, and then the islands are covered by stable low-index facets. In this growth step, the island size becomes uniform, because of the self-limited growth. In the next step, we found indium flow back from the islands into the wetting layer, which causes shrinkage of the island size as well as formation of giant islands. This indium flow back can be controlled by As pressure.
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