{"title":"T2: VLSI测试和老化优化的统计方法","authors":"A. Singh","doi":"10.1109/ATS.2005.104","DOIUrl":null,"url":null,"abstract":"VLSI circuits have been traditionally tested individually following manufacture; the same tests being applied to all ICs. However, as manufacturing test costs continue to show a disproportionate increase in relation to IC fabrication costs, innovative new statistical methods are being introduced to optimize testing. Such methods fall into two broad categories: those that exploit statistical information in regard to the variation of process parameters on wafers, and those that exploit the statistics of defect distributions on wafers. This tutorial presents test methodologies that span both these categories and illustrate their effectiveness with experimental results from a number of recent studies on production circuits from LSI Logic, IBM, Intel and TI","PeriodicalId":373563,"journal":{"name":"14th Asian Test Symposium (ATS'05)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"T2: Statistical Methods for VLSI Test and Burn-in Optimization\",\"authors\":\"A. Singh\",\"doi\":\"10.1109/ATS.2005.104\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"VLSI circuits have been traditionally tested individually following manufacture; the same tests being applied to all ICs. However, as manufacturing test costs continue to show a disproportionate increase in relation to IC fabrication costs, innovative new statistical methods are being introduced to optimize testing. Such methods fall into two broad categories: those that exploit statistical information in regard to the variation of process parameters on wafers, and those that exploit the statistics of defect distributions on wafers. This tutorial presents test methodologies that span both these categories and illustrate their effectiveness with experimental results from a number of recent studies on production circuits from LSI Logic, IBM, Intel and TI\",\"PeriodicalId\":373563,\"journal\":{\"name\":\"14th Asian Test Symposium (ATS'05)\",\"volume\":\"31 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-12-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"14th Asian Test Symposium (ATS'05)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ATS.2005.104\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"14th Asian Test Symposium (ATS'05)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ATS.2005.104","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
T2: Statistical Methods for VLSI Test and Burn-in Optimization
VLSI circuits have been traditionally tested individually following manufacture; the same tests being applied to all ICs. However, as manufacturing test costs continue to show a disproportionate increase in relation to IC fabrication costs, innovative new statistical methods are being introduced to optimize testing. Such methods fall into two broad categories: those that exploit statistical information in regard to the variation of process parameters on wafers, and those that exploit the statistics of defect distributions on wafers. This tutorial presents test methodologies that span both these categories and illustrate their effectiveness with experimental results from a number of recent studies on production circuits from LSI Logic, IBM, Intel and TI